Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FDPS | P14324 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11511611 | 0.84 | CYP1A2 (0.32) | — | |
| SCHEMBL11521822 | 0.80 | MMP1 (0.34) | — | |
| SCHEMBL28950672 | 0.78 | DNM1 (0.37) | — | |
| SCHEMBL13452916 | 0.77 | FDPS (0.40) | FDPS | |
| SCHEMBL172247 | 0.77 | FDPS (0.40) | FDPS | |
| SCHEMBL15016002 | 0.77 | FDPS (0.33) | FDPS | |
| SCHEMBL6441469 | 0.77 | DNM1 (0.41) | — | |
| SCHEMBL11524376 | 0.77 | DNM1 (0.41) | — | |
| SCHEMBL9706114 | 0.77 | FDPS (0.31) | FDPS | |
| SCHEMBL1686727 | 0.75 | CYP1A2 (0.48) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2605069-B1 | RINSE LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING PATTERN USING SAME | MERCK PATENT GMBH (DE) | 2021-09-22 | — | — | EP | claimed |
| EP-3208659-A1 | COMPOSITION FOR RESIST PATTERNING AND METHOD FOR FORMING PATTERN USING SAME | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2017-08-23 | — | — | EP | claimed |
| US-20170219927-A1 | COMPOSITION FOR RESIST PATTERNING AND METHOD FOR FORMING PATTERN USING SAME | AZ ELECTRIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2017-08-03 | — | — | US | claimed |
| US-20130164694-A1 | RINSE SOLUTION FOR LITHOGRAPHY AND PATTERN FORMATION METHOD EMPLOYING THE SAME | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2013-06-27 | — | — | US | claimed |
| EP-2605069-A1 | RINSE LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING PATTERN USING SAME | AZ Electronic Materials USA Corp. (US) | 2013-06-19 | — | — | EP | claimed |
| EP-4720172-A1 | SIDE-CHAIN FUNCTIONALIZED POLYNORBORNENES AS IONOMERS AND AS MEMBRANE MATERIALS FOR ALKALINE ELECTROLYSIS OF WATER, AND FUEL CELL | Forschungszentrum Jülich GmbH (DE) | 2026-04-08 | — | — | EP | disclosed |
| WO-2025242796-A1 | HYDROGENATED SIDE-CHAIN FUNCTIONALIZED POLYNORBORNENE-ANION EXCHANGE POLYMERS AS MEMBRANE MATERIALS FOR ALKALINE WATER ELECTROLYSIS AND FUEL CELLS | Forschungszentrum Jülich GmbH (DE) | 2025-11-27 | — | — | WO | disclosed |
| US-12372875-B2 | Composition for resist pattern metallization process | NISSAN CHEMICAL CORPORATION (JP) | 2025-07-29 | — | — | US | disclosed |
| US-20250206901-A1 | BRUSH MATERIAL FOR SELF-ASSEMBLED FILM | NISSAN CHEMICAL CORPORATION (JP) | 2025-06-26 | — | — | US | disclosed |
| CN-113785243-B | Composition for resist pattern metallization process | 日产化学株式会社 | 2025-05-02 | — | — | CN | disclosed |
| WO-2024258076-A1 | PHOTORESIST CLEANING SOLUTION COMPOSITION AND METHOD FOR FORMING PHOTORESIST PATTERN USING SAME | 에스케이 주식회사 | 2024-12-19 | — | — | WO | disclosed |
| WO-2024258074-A1 | PHOTORESIST CLEANING SOLUTION COMPOSITION, AND METHOD FOR FORMING PHOTORESIST PATTERN BY USING SAME | 에스케이 주식회사 | 2024-12-19 | — | — | WO | disclosed |
| EP-1309531-A1 | DERIVATIVES OF 4-(TRIFLUOROMETHYL)-PHENOL AND 4-(TRIFLUOROMETHYLPHENYL)-2-(TETRAHYDROPYRANYL) ETHER AND METHOD FOR PRODUCING THE SAME | BASF AKTIENGESELLSCHAFT (DE) | 2003-05-14 | — | — | EP | disclosed |
| WO-2002014250-A1 | DERIVATIVES OF 4-(TRIFLUOROMETHYL)-PHENOL AND 4-(TRIFLUOROMETHYLPHENYL)-2-(TETRAHYDROPYRANYL) ETHER AND METHOD FOR PRODUCING THE SAME | BASF AKTIENGESELLSCHAFT (DE) | 2002-02-21 | — | — | WO | disclosed |
| EP-0424171-B1 | Perfluoro-N,N,N',N'-tetrapropyldiaminopropane and use thereof in vapor phase heating | MINNESOTA MINING & MFG (US) | 1993-12-29 | — | — | EP | disclosed |
| US-5104034-A | PERFLUORO-N,N,N',N-TETRAPROPYLDIAMINOPROPANE AND USE THEREOF IN VAPOR PHASE HEATING | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1992-04-14 | — | — | US | disclosed |
| EP-0424171-A2 | Perfluoro-N,N,N',N'-tetrapropyldiaminopropane and use thereof in vapor phase heating | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1991-04-24 | — | — | EP | disclosed |
| US-4179471-A | PROMOTER COMPOSITION OF NAPTHALENE, TERT-AMINE AND A TERT-ALCOHOL OR SALT THEREOF, ALKALI METAL CATALYST | PHILLIPS PETROLEUM COMPANY (US) | 1979-12-18 | — | — | US | disclosed |
| US-4179472-A | ALKALI METAL CATALYST; BIPHENYL, CONJUGATED DIENE, TERT-AMINE, NAPHTHALENE PROMOTERS | PHILLIPS PETROLEUM COMPANY (US) | 1979-12-18 | — | — | US | disclosed |
| US-3968298-A | Process for imparting to natural keratin-containing material a permanent finish rendering the material resistant to damage by insects | CIBA-GEIGY CORPORATION (US) | 1976-07-06 | — | — | US | disclosed |