Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 6/20 | 0.61 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.61 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.61 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.61 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.61 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.61 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.61 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.58 |
| ▸ | RAB9A | P51151 | 9/20 | 0.57 |
| ▸ | NPC1 | O15118 | 8/20 | 0.57 |
| ▸ | MAPT | P10636 | 4/20 | 0.57 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.56 |
| ▸ | POLB | P06746 | 1/20 | 0.56 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.54 |
| ▸ | GAA | P10253 | 1/20 | 0.54 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.51 |
| ▸ | LMNA | P02545 | 1/20 | 0.51 |
| ▸ | CASP3 | P42574 | 1/20 | 0.51 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.51 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13609717 | 0.95 | TDP1 (0.57) | MEN1KMT2AALDH1A1CYP1A2KDM4E | |
| SCHEMBL27643096 | 0.90 | FYN (0.53) | MEN1KMT2AALDH1A1CYP1A2KDM4E | |
| SCHEMBL13609728 | 0.85 | TDP1 (0.54) | MEN1KMT2AALDH1A1CYP1A2KDM4E | |
| SCHEMBL10040412 | 0.85 | TDP1 (0.53) | MEN1KMT2AALDH1A1CYP1A2KDM4E | |
| SCHEMBL10064083 | 0.83 | TDP1 (0.51) | MEN1KMT2AALDH1A1CYP1A2KDM4E | |
| SCHEMBL397717 | 0.83 | SMN1; SMN2 (0.61) | MEN1KMT2AALDH1A1KDM4EMAPT | |
| SCHEMBL7782556 | 0.83 | LMNA (0.54) | MEN1KMT2AALDH1A1CYP1A2KDM4E | |
| SCHEMBL398954 | 0.83 | SMN1; SMN2 (0.68) | MEN1KMT2AALDH1A1KDM4EMAPT | |
| SCHEMBL397572 | 0.83 | AKR1C3 (0.59) | MEN1KMT2AALDH1A1TDP1MAPT | |
| SCHEMBL27643095 | 0.82 | TDP1 (0.45) | MEN1KMT2AALDH1A1CYP1A2KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 76 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1964893-B2 | Ink composition, inkjet recording method, printed material, and ink set | FUJIFILM CORP (JP) | 2021-11-24 | — | — | EP | disclosed |
| US-10191373-B2 | Method for producing polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-01-29 | — | — | US | disclosed |
| EP-1964893-B1 | Ink composition, inkjet recording method, printed material, and ink set | FUJIFILM CORP (JP) | 2018-01-24 | — | — | EP | disclosed |
| US-20170226250-A1 | POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-10 | — | — | US | disclosed |
| US-20170226250-A1 | POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-10 | — | — | US | disclosed |
| US-20170097567-A1 | METHOD FOR PRODUCING POLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-06 | — | — | US | disclosed |
| US-20170097567-A1 | METHOD FOR PRODUCING POLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-06 | — | — | US | disclosed |
| US-20160229940-A1 | POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-11 | — | — | US | disclosed |
| US-20160229940-A1 | POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-11 | — | — | US | disclosed |
| US-20160168296-A1 | POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-16 | — | — | US | disclosed |
| US-20080075882-A1 | PROCESS FOR PRODUCING MOLDED PRINTED MATERIAL, AND MOLDED PRINTED MATERIAL | FUJIFILM CORPORATION (JP) | 2008-03-27 | — | — | US | disclosed |
| US-20080075882-A1 | PROCESS FOR PRODUCING MOLDED PRINTED MATERIAL, AND MOLDED PRINTED MATERIAL | FUJIFILM CORPORATION (JP) | 2008-03-27 | — | — | US | disclosed |
| CN-1790772-A | Patterned substrate, electro-optical device, and method for manufacturing an electro-optical device | SEIKO EPSON CORP (JP) | 2006-06-21 | — | — | CN | disclosed |
| US-5998091-A | COPOLYMER OF A MONOFUNCTIONAL MACROMONOMER HAVING A PARTICULAR POLYMERIZABLE DOUBLE BOND-CONTAINING GROUP SITUATED AT ONLY ONE END OF THE MAIN CHAIN, A QUATERNARY AMMONIUM SALT AND AN AMIDE | FUJI PHOTO FILM CO., LTD. (JP) | 1999-12-07 | — | — | US | disclosed |
| EP-0505972-B1 | Process for producing styrenic copolymer | IDEMITSU KOSAN CO (JP) | 1997-06-11 | — | — | EP | disclosed |
| EP-0750899-A2 | An emulsifier or solubilizer which consists of a water soluble amphiphilic polyelectrolyte, and an emulsified composition or a solubilized composition and an emulsified cosmetic or a solubilized cosmetic containing it | SHISEIDO COMPANY LIMITED (JP) | 1997-01-02 | — | — | EP | disclosed |
| EP-0490269-B1 | Graft copolymer and process for producing the same | IDEMITSU KOSAN CO (JP) | 1996-02-28 | — | — | EP | disclosed |
| US-5250629-A | Graft polymerization of styrene and ethylenically unsaturated monomer using transition metal catalysts, organoaluminum compounds; films, packaging, automobile parts | IDEMITSU KOSAN CO., LTD. (JP) | 1993-10-05 | — | — | US | disclosed |
| EP-0505972-A2 | Process for producing styrenic copolymer | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1992-09-30 | — | — | EP | disclosed |
| EP-0490269-A1 | Graft copolymer and process for producing the same | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1992-06-17 | — | — | EP | disclosed |