Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 1/20 | 0.61 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.61 |
| ▸ | NR1H2 | P55055 | 14/20 | 0.58 |
| ▸ | NR1H3 | Q13133 | 14/20 | 0.58 |
| ▸ | MLYCD | O95822 | 2/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL131990 | 0.89 | NR1H2 (0.68) | NR1H2NR1H3MLYCDSMN1; SMN2 | |
| Water SCHEMBL1684070 | 0.86 | NR1H2 (0.65) | NR1H2NR1H3MLYCDSMN1; SMN2 | |
| SCHEMBL18716 | 0.82 | NR1H2 (0.56) | NR1H2NR1H3MLYCDSMN1; SMN2 | |
| SCHEMBL24901413 | 0.81 | NR1H2 (0.61) | NR1H2NR1H3MLYCDSMN1; SMN2 | |
| SCHEMBL9621271 | 0.81 | NR1H2 (0.60) | NR1H2NR1H3MLYCDSMN1; SMN2 | |
| SCHEMBL8021367 | 0.79 | NR1H2 (0.58) | NR1H2NR1H3MLYCDSMN1; SMN2 | |
| SCHEMBL1516045 | 0.79 | ESR1 (0.61) | ESR1ESR2NR1H2NR1H3MLYCD | |
| SCHEMBL19224 | 0.77 | NR1H2 (0.56) | NR1H2NR1H3MLYCDSMN1; SMN2 | |
| SCHEMBL14593303 | 0.77 | NR1H2 (0.61) | ESR1ESR2NR1H2NR1H3MLYCD | |
| SCHEMBL17054 | 0.77 | NR1H2 (0.56) | NR1H2NR1H3MLYCDSMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7169869-B2 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-30 | — | — | US | disclosed |
| US-7169869-B2 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-30 | — | — | US | disclosed |
| US-20040122179-A1 | Structures providing low absorbing polymers at 157 nm wavelengths | CORNELL RESEARCH FOUNDATION, INC. | 2004-06-24 | — | — | US | disclosed |