SCHEMBL9621271

SCHEMBL9621271

OC(c1ccc(-c2ccc(C(O)(C(F)(F)F)C(F)(F)F)cc2)cc1)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.65

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
NR1H2 P55055 12/20 0.60
NR1H3 Q13133 12/20 0.60
MLYCD O95822 3/20 0.52
SMN1; SMN2 Q16637 2/20 0.50
KIF11 P52732 1/20 0.48
RORC P51449 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL131990 0.91 NR1H2 (0.68) NR1H2NR1H3MLYCDSMN1; SMN2
SCHEMBL19149374 0.91 NR1H3 (0.60) NR1H2NR1H3MLYCDKIF11
SCHEMBL24031020 0.89 KIF11 (0.61) NR1H2NR1H3MLYCDKIF11
Water SCHEMBL1684070 0.88 NR1H2 (0.65) NR1H2NR1H3MLYCDSMN1; SMN2
SCHEMBL24901413 0.83 NR1H2 (0.61) NR1H2NR1H3MLYCDSMN1; SMN2RORC
SCHEMBL12441428 0.83 NR1H3 (0.50) NR1H2NR1H3MLYCDKIF11
SCHEMBL18202055 0.83 PTPN5 (0.57) NR1H2NR1H3MLYCDRORC
SCHEMBL18202059 0.83 NR1H2 (0.56) NR1H2NR1H3MLYCDRORC
SCHEMBL15842058 0.83 KIF11 (0.46) NR1H2NR1H3MLYCDSMN1; SMN2KIF11
SCHEMBL13860280 0.83 RXRA (0.58) NR1H2NR1H3MLYCDSMN1; SMN2RORC

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3064996-B1 LIQUID DISCHARGE HEAD CANON KK (JP) 2020-07-22 EP disclosed
EP-2531890-B1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING STRUCTURE, AND LIQUID DISCHARGE HEAD CANON KK (JP) 2019-08-28 EP disclosed
EP-3064996-A1 LIQUID DISCHARGE HEAD Canon Kabushiki Kaisha (JP) 2016-09-07 EP disclosed
US-8980968-B2 Photosensitive resin composition, method for producing structure, and liquid discharge head CANON KABUSHIKI KAISHA (JP) 2015-03-17 US disclosed
US-8980968-B2 Photosensitive resin composition, method for producing structure, and liquid discharge head CANON KABUSHIKI KAISHA (JP) 2015-03-17 US disclosed
US-20120292412-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING STRUCTURE, AND LIQUID DISCHARGE HEAD CANON KABUSHIKI KAISHA (JP) 2012-11-22 US disclosed
US-20120292412-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING STRUCTURE, AND LIQUID DISCHARGE HEAD CANON KABUSHIKI KAISHA (JP) 2012-11-22 US disclosed
WO-2011096195-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING STRUCTURE, AND LIQUID DISCHARGE HEAD CANON KABUSHIKI KAISHA (JP) 2011-08-11 WO disclosed
US-7553544-B2 Precursor composition for optical resin, resin for optical use, optical element, and optical article NIKON CORPORATION (JP) 2009-06-30 US disclosed
US-7553544-B2 Precursor composition for optical resin, resin for optical use, optical element, and optical article NIKON CORPORATION (JP) 2009-06-30 US disclosed
US-7169869-B2 Polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-01-30 US disclosed
US-7169869-B2 Polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-01-30 US disclosed
US-5118874-A Intermediates for polycondensates HOECHST AKTIENGESELLSCHAFT (DE) 1992-06-02 US disclosed
EP-0464472-A2 Partially fluorinated biphenyls, method of making them and their application HOECHST AKTIENGESELLSCHAFT (DE) 1992-01-08 EP disclosed