SCHEMBL8021367

SCHEMBL8021367

OC(c1ccc(F)cc1)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.62

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
▸ NR1H2 P55055 13/20 0.58
▸ NR1H3 Q13133 13/20 0.58
▸ RORC P51449 3/20 0.51
▸ NR1I2 O75469 2/20 0.51
▸ RORA P35398 1/20 0.51
▸ RORB Q92753 1/20 0.51
▸ NR1H4 Q96RI1 1/20 0.51
▸ MLYCD O95822 1/20 0.50
▸ SMN1; SMN2 Q16637 2/20 0.48
▸ USP2 O75604 1/20 0.46
▸ RAB9A P51151 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL131990 0.89 NR1H2 (0.68) NR1H2NR1H3MLYCDSMN1; SMN2
Water SCHEMBL1684070 0.86 NR1H2 (0.65) NR1H2NR1H3MLYCDSMN1; SMN2
SCHEMBL9621271 0.81 NR1H2 (0.60) NR1H2NR1H3RORCMLYCDSMN1; SMN2
SCHEMBL24901413 0.81 NR1H2 (0.61) NR1H2NR1H3RORCMLYCDSMN1; SMN2
SCHEMBL6808538 0.79 ESR1 (0.61) NR1H2NR1H3MLYCDSMN1; SMN2
SCHEMBL1516045 0.79 ESR1 (0.61) NR1H2NR1H3MLYCDSMN1; SMN2
SCHEMBL5314331 0.78 RORC (0.79) RORCSMN1; SMN2RAB9A
SCHEMBL20149020 0.78 NR1H2 (0.45) NR1H2NR1H3RORCNR1I2RORA
SCHEMBL20148977 0.78 RORC (0.46) NR1H2NR1H3RORCNR1I2
SCHEMBL128398 0.77 NR1H2 (0.56) NR1H2NR1H3MLYCDSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-1050833-A — — None — — JP disclosed
US-11785845-B2 Composition FUJIFILM CORPORATION (JP) 2023-10-10 — — US disclosed
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 — — US disclosed
US-20230019681-A1 POSITIVE RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-19 — — US disclosed
US-20220045283-A1 COMPOSITION FUJIFILM CORPORATION (JP) 2022-02-10 — — US disclosed
US-6114345-A Phenylsubstituted 4-azasteroid fluoroderivatives PHARMACIA & UPJOHN, S.P.A. (IT) 2000-09-05 — — US disclosed
EP-0793671-B1 PHENYLSUBSTITUTED 4-AZASTEROID FLUORODERIVATIVES PHARMACIA & UPJOHN SPA (IT) 2000-02-09 — — EP disclosed
US-5922728-A N-(PHENYLPERFLUOROALKYL)-3-OXO-4-AZA-5ALPHA-(ANDROSTANE OR ANDROST-1-ENE)-17BETA-CARBOXAMIDE DERIVATIVES, METHODS OF SYNTHESIZING THEM AND THEIR USE FOR TREATING PROSTATIC HYPERPLASIA PHARMACIA & UPJOHN, S.P.A. (IT) 1999-07-13 — — US disclosed
US-5827611-A Multilayered thermoplastic article with special properties HOECHST CELANESE CORP (US) 1998-10-27 — — US disclosed
EP-0793671-A1 PHENYLSUBSTITUTED 4-AZASTEROID FLUORODERIVATIVES PHARMACIA & UPJOHN S.p.A. (IT) 1997-09-10 — — EP disclosed
US-5175790-A Waveguides for long distance transmission, high temperature continuous use HOECHST AKTIENGESELLSCHAFT (DE) 1992-12-29 — — US disclosed
EP-0467935-A1 TRANSPARENT THERMOPLASTIC MOULDING MATERIAL CONSISTING OF ESTERS OF 2,3-DIFLUORACRYLIC ACID. HOECHST AG (DE) 1992-01-29 — — EP disclosed
CN-1010098-B Process for preparing alpha-fluoroacrylate polymers HOECHST AG (DE) 1990-10-24 — — CN disclosed
WO-1990012040-A1 TRANSPARENT THERMOPLASTIC MOULDING MATERIAL CONSISTING OF ESTERS OF 2,3-DIFLUORACRYLIC ACID HOECHST AKTIENGESELLSCHAFT (DE) 1990-10-18 — — WO disclosed
EP-0203462-B1 ALPHA-FLUOROACRYLIC-ACID ESTERS AND THEIR POLYMERS HOECHST AKTIENGESELLSCHAFT (DE) 1990-08-01 — — EP disclosed
CN-1006380-B Preparation method of alpha-fluoroacrylate and polymer thereof HOECHST AG (DE) 1990-01-10 — — CN disclosed
CN-1036209-A Process for preparing alpha-fluoroacrylate polymers HOECHST AG (DE) 1989-10-11 — — CN disclosed
JP-S6450833-A PRODUCTION OF 2,2-BIS(4-FLUOROPHENYL)HEXAFLUOROPROPANE CENTRAL GLASS CO LTD 1989-02-27 — — JP disclosed
CN-86103531-A Alpha-fluoroacrylates and polymers thereof — 1987-01-28 — — CN disclosed
EP-0203462-A2 Alpha-fluoroacrylic-acid esters and their polymers HOECHST AKTIENGESELLSCHAFT (DE) 1986-12-03 — — EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20220045283-A1 COMPOSITION ADH1A, ADH1C, SLC19A2 NR1H2 794/4885NR1H3 515/4885RORC 2360/4885
US-11785845-B2 Composition ADH1A, ADH1C, SLC19A2 NR1H2 794/4885NR1H3 515/4885RORC 2360/4885
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS HNRNPU, EWSR1, HNRNPR NR1H2 3896/4885NR1H3 3340/4885RORC 3434/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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