SCHEMBL682069

SCHEMBL682069

COC(C)OCCOc1ccccc1C1CCCCC1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR1D P28221 2/20 0.52
HTR1B P28222 2/20 0.52
PTGDR2 Q9Y5Y4 2/20 0.50
HTR1A P08908 5/20 0.45
ADRA2A P08913 3/20 0.45
SLC6A2 P23975 2/20 0.45
SLC6A4 P31645 2/20 0.45
ADRA1A P35348 2/20 0.45
USP2 O75604 1/20 0.45
CYP1A2 P05177 1/20 0.45
CYP2D6 P10635 1/20 0.45
CHRM1 P11229 1/20 0.45
CYP2C9 P11712 1/20 0.45
DRD1 P21728 1/20 0.45
TBXA2R P21731 1/20 0.45
PTGS1 P23219 1/20 0.45
OPRM1 P35372 1/20 0.45
DRD3 P35462 1/20 0.45
KCNH2 Q12809 1/20 0.45
ADRA2B P18089 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL682070 0.99 HTR1D (0.53) HTR1DHTR1BPTGDR2HTR1AADRA2A
SCHEMBL14094035 0.88 HTR1D (0.51) HTR1DHTR1BPTGDR2HTR1AADRA2A
SCHEMBL14443352 0.87 HTR1D (0.56) HTR1DHTR1BPTGDR2HTR1AADRA2A
SCHEMBL14443355 0.86 HTR1D (0.57) HTR1DHTR1BPTGDR2HTR1AADRA2A
SCHEMBL12974762 0.83 HTR2C (0.38) HTR1DHTR1BPTGDR2HTR1AADRA2A
SCHEMBL682825 0.81 ALDH1A1 (0.44) HTR1AADRA2AADRA2BADRA2CKMT2A
SCHEMBL682836 0.80 ALDH1A1 (0.45) HTR1AADRA2AADRA2BADRA2CKMT2A
SCHEMBL683254 0.79 HTR1D (0.46) HTR1DHTR1BPTGDR2HTR1AADRA2A
SCHEMBL24893446 0.77 ADRA2A (0.58) HTR1DHTR1BPTGDR2HTR1AADRA2A
SCHEMBL11373736 0.75 PTGDR2 (0.63) HTR1DHTR1BPTGDR2HTR1AADRA2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
WO-2010150917-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2010-12-29 WO disclosed