SCHEMBL683254

SCHEMBL683254

CCC(C)c1ccc(OC(C)OCCOc2ccccc2C2CCCCC2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR1D P28221 2/20 0.46
HTR1B P28222 2/20 0.46
PTGDR2 Q9Y5Y4 1/20 0.41
ADRA2A P08913 3/20 0.38
HTR1A P08908 3/20 0.38
ADRA2B P18089 2/20 0.38
ADRA2C P18825 2/20 0.38
USP2 O75604 1/20 0.38
CYP1A2 P05177 1/20 0.38
CYP2D6 P10635 1/20 0.38
CHRM1 P11229 1/20 0.38
CYP2C9 P11712 1/20 0.38
DRD1 P21728 1/20 0.38
TBXA2R P21731 1/20 0.38
PTGS1 P23219 1/20 0.38
SLC6A2 P23975 1/20 0.38
SLC6A4 P31645 1/20 0.38
ADRA1A P35348 1/20 0.38
OPRM1 P35372 1/20 0.38
DRD3 P35462 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL111764 0.82 ALDH1A1 (0.46) CYP2C9KCNH2ALDH1A1KMT2ATSHR
SCHEMBL683620 0.81 ALDH1A1 (0.47) CYP2C9KCNH2ALDH1A1KMT2ATSHR
SCHEMBL683579 0.80 PPARG (0.40) HTR1ADRD3ALDH1A1PRMT5WDR77
SCHEMBL682069 0.79 HTR1D (0.52) HTR1DHTR1BPTGDR2ADRA2AHTR1A
SCHEMBL2758502 0.79 KDM4E (0.45) USP2ALDH1A1SLC7A5HTR7HTT
SCHEMBL683286 0.78 SLC7A5 (0.43) ADRA2ACYP1A2CYP2D6CYP2C9ALDH1A1
SCHEMBL14094035 0.78 HTR1D (0.51) HTR1DHTR1BPTGDR2ADRA2AHTR1A
SCHEMBL683605 0.78 ALDH1A1 (0.46) CYP1A2CYP2D6ALDH1A1KMT2ATSHR
SCHEMBL682070 0.78 HTR1D (0.53) HTR1DHTR1BPTGDR2ADRA2AHTR1A
SCHEMBL14443352 0.78 HTR1D (0.56) HTR1DHTR1BPTGDR2ADRA2AHTR1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
WO-2010150917-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2010-12-29 WO disclosed
US-7344821-B2 Positive resist composition for use with electron beam, EUV light or X ray, and pattern formation method using the same FUJIFILM CORPORATION (JP) 2008-03-18 US disclosed
US-7326513-B2 Positive working resist composition FUJIFILM CORPORATION (JP) 2008-02-05 US disclosed
US-7250246-B2 Positive resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2007-07-31 US disclosed