SCHEMBL682235

SCHEMBL682235

CCC(C)c1ccc(OC(C)OCCOc2ccc(OC)cc2)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.48
GAA P10253 2/20 0.48
MAPT P10636 1/20 0.48
TSHR P16473 1/20 0.46
MEN1 O00255 1/20 0.45
KMT2A Q03164 1/20 0.45
TDP1 Q9NUW8 1/20 0.45
FAAH O00519 1/20 0.40
SMN1; SMN2 Q16637 2/20 0.39
LMNA P02545 1/20 0.39
NPC1 O15118 2/20 0.39
RAB9A P51151 2/20 0.39
HSP90AA1 P07900 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
SLC7A5 Q01650 1/20 0.39
NPBWR1 P48145 1/20 0.38
MCHR1 Q99705 1/20 0.38
KCNH2 Q12809 2/20 0.38
HPGD P15428 1/20 0.38
ORAI1 Q96D31 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10148540 0.92 ALDH1A1 (0.43) ALDH1A1GAAMAPTTSHRMEN1
SCHEMBL683310 0.89 ABCB11 (0.46) ALDH1A1GAAMAPTTSHRMEN1
SCHEMBL111973 0.89 ALDH1A1 (0.49) ALDH1A1TSHRMEN1KMT2ATDP1
SCHEMBL2758470 0.88 NPSR1 (0.49) ALDH1A1GAAMAPTTSHRMEN1
SCHEMBL14258895 0.88 ALDH1A1 (0.47) ALDH1A1GAAMAPTTSHRMEN1
SCHEMBL682951 0.87 ALDH1A1 (0.48) ALDH1A1TSHRMEN1KMT2ATDP1
SCHEMBL2758476 0.87 ABCB11 (0.44) ALDH1A1GAAMAPTTSHRMEN1
SCHEMBL14252111 0.86 ALDH1A1 (0.47) ALDH1A1TSHRMEN1KMT2ATDP1
SCHEMBL11999032 0.85 NPSR1 (0.40) ALDH1A1GAAMAPTTSHRMEN1
SCHEMBL2758468 0.85 HIF1A (0.46) ALDH1A1GAAMAPTTSHRMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120003585-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-01-05 US disclosed
US-7344821-B2 Positive resist composition for use with electron beam, EUV light or X ray, and pattern formation method using the same FUJIFILM CORPORATION (JP) 2008-03-18 US disclosed
US-7326513-B2 Positive working resist composition FUJIFILM CORPORATION (JP) 2008-02-05 US disclosed