SCHEMBL682694

SCHEMBL682694

CCCCCCc1ccc(OCCOC(C)OC)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.58
LMNA P02545 2/20 0.58
CYP3A4 P08684 2/20 0.58
MEN1 O00255 1/20 0.58
USP2 O75604 1/20 0.58
MAPK1 P28482 1/20 0.58
CASP1 P29466 1/20 0.58
KMT2A Q03164 1/20 0.58
SMN1; SMN2 Q16637 1/20 0.58
SLCO1B3 Q9NPD5 1/20 0.58
SLCO1B1 Q9Y6L6 1/20 0.58
PLA2G4A P47712 1/20 0.44
S1PR1 P21453 3/20 0.44
NR5A1 Q13285 1/20 0.44
TP53 P04637 2/20 0.44
NPC1 O15118 1/20 0.44
HPGD P15428 1/20 0.44
RAB9A P51151 1/20 0.44
S1PR4 O95977 2/20 0.43
S1PR5 Q9H228 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL682704 0.99 MEN1 (0.56) ALDH1A1LMNACYP3A4MEN1USP2
SCHEMBL682083 0.90 NR5A1 (0.54) LMNANR5A1TP53NPC1HPGD
SCHEMBL682076 0.88 NR5A1 (0.51) LMNANR5A1TP53NPC1HPGD
SCHEMBL8365267 0.87 ALDH1A1 (0.57) ALDH1A1LMNACYP3A4MEN1USP2
SCHEMBL13618134 0.87 ALDH1A1 (0.59) ALDH1A1LMNACYP3A4MEN1USP2
SCHEMBL14443351 0.87 ALDH1A1 (0.62) ALDH1A1LMNACYP3A4MEN1USP2
SCHEMBL14443353 0.85 MEN1 (0.60) ALDH1A1LMNACYP3A4MEN1USP2
SCHEMBL9215261 0.83 ALDH1A1 (0.73) ALDH1A1LMNACYP3A4MEN1USP2
SCHEMBL9610966 0.82 ALDH1A1 (0.68) ALDH1A1LMNACYP3A4MEN1USP2
SCHEMBL9357898 0.81 ALDH1A1 (0.71) ALDH1A1LMNACYP3A4MEN1USP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
WO-2010150917-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2010-12-29 WO disclosed