SCHEMBL682704

SCHEMBL682704

CCCCCc1ccc(OCCOC(C)OC)cc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.56
USP2 O75604 1/20 0.56
ALDH1A1 P00352 1/20 0.56
LMNA P02545 1/20 0.56
CYP3A4 P08684 1/20 0.56
MAPK1 P28482 1/20 0.56
CASP1 P29466 1/20 0.56
KMT2A Q03164 1/20 0.56
SMN1; SMN2 Q16637 1/20 0.56
SLCO1B3 Q9NPD5 1/20 0.56
SLCO1B1 Q9Y6L6 1/20 0.56
PLA2G4A P47712 1/20 0.43
S1PR1 P21453 1/20 0.42
HRH3 Q9Y5N1 1/20 0.42
RAB9A P51151 2/20 0.42
MAPT P10636 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
NPC1 O15118 1/20 0.42
TP53 P04637 1/20 0.42
HPGD P15428 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL682694 0.99 ALDH1A1 (0.58) MEN1USP2ALDH1A1LMNACYP3A4
SCHEMBL682076 0.89 NR5A1 (0.51) LMNARAB9AMAPTNPC1TP53
SCHEMBL682083 0.88 NR5A1 (0.54) LMNARAB9AMAPTNPC1TP53
SCHEMBL14443353 0.86 MEN1 (0.60) MEN1USP2ALDH1A1LMNACYP3A4
SCHEMBL8365267 0.86 ALDH1A1 (0.57) MEN1USP2ALDH1A1LMNACYP3A4
SCHEMBL13618134 0.85 ALDH1A1 (0.59) MEN1USP2ALDH1A1LMNACYP3A4
SCHEMBL14443351 0.85 ALDH1A1 (0.62) MEN1USP2ALDH1A1LMNACYP3A4
SCHEMBL17547183 0.81 LMNA (0.54) MEN1USP2ALDH1A1LMNACYP3A4
SCHEMBL27447908 0.81 ALDH1A1 (0.68) MEN1USP2ALDH1A1LMNACYP3A4
SCHEMBL9215261 0.81 ALDH1A1 (0.73) MEN1USP2ALDH1A1LMNACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
WO-2010150917-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2010-12-29 WO disclosed