SCHEMBL682083

SCHEMBL682083

CCCCCCOc1ccc(OCCOC(C)OC)cc1

nearest known ligand 0.54

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
NR5A1 Q13285 1/20 0.54
LTA4H P09960 3/20 0.50
TP53 P04637 3/20 0.49
TSHR P16473 1/20 0.49
PLA2G4B P0C869 2/20 0.47
NPC1 O15118 2/20 0.46
RAB9A P51151 2/20 0.46
HPGD P15428 1/20 0.46
RARB P10826 3/20 0.45
LMNA P02545 1/20 0.45
GAA P10253 1/20 0.45
MAPT P10636 1/20 0.45
ALOX15 P16050 1/20 0.45
HSD17B10 Q99714 1/20 0.45
SLC2A1 P11166 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL682076 0.98 NR5A1 (0.51) NR5A1LTA4HTP53TSHRPLA2G4B
SCHEMBL682694 0.90 ALDH1A1 (0.58) NR5A1TP53NPC1RAB9AHPGD
SCHEMBL682704 0.88 MEN1 (0.56) TP53NPC1RAB9AHPGDLMNA
SCHEMBL14443359 0.84 NR5A1 (0.59) NR5A1LTA4HTP53TSHRPLA2G4B
SCHEMBL682086 0.84 MEN1 (0.47) TP53PLA2G4BLMNAMAPT
SCHEMBL19497635 0.82 CYP2C9 (0.44) TSHRRAB9AHPGDMAPT
SCHEMBL14443363 0.82 NR5A1 (0.56) NR5A1LTA4HTP53TSHRPLA2G4B
SCHEMBL683138 0.82 CYP1A2 (0.45) LTA4HTP53LMNAMAPT
SCHEMBL4580487 0.80 DNM1 (0.48) TSHR
SCHEMBL3502859 0.80 DNM1 (0.48) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
WO-2010150917-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2010-12-29 WO disclosed