SCHEMBL682188

SCHEMBL682188

CCC(C)c1ccc(OC(C)OCCOc2ccc(C(C)(C)C)cc2C(C)(C)C)cc1

nearest known ligand 0.36

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
KCNH2 Q12809 1/20 0.36
MAPK1 P28482 2/20 0.35
MAPT P10636 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35
ALDH1A1 P00352 5/20 0.34
TSHR P16473 1/20 0.34
KDM4E B2RXH2 5/20 0.34
TDP1 Q9NUW8 2/20 0.34
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
SLC7A5 Q01650 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
TRPV1 Q8NER1 1/20 0.31
RECQL P46063 1/20 0.31
LMNA P02545 1/20 0.31
HTT P42858 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10148362 0.85 ALDH1A1 (0.45) KCNH2ALDH1A1TSHRKDM4ETDP1
SCHEMBL683261 0.81 ALDH1A1 (0.40) KCNH2MAPTALDH1A1TSHRTDP1
SCHEMBL12974532 0.81 SLC7A5 (0.34) ALDH1A1TSHRTDP1MEN1KMT2A
SCHEMBL13879094 0.80 ALDH1A1 (0.45) KCNH2MAPTALDH1A1TSHRKDM4E
SCHEMBL683265 0.79 ALDH1A1 (0.37) KCNH2MAPTALDH1A1TSHRKDM4E
SCHEMBL13018299 0.79 ALDH1A1 (0.40) KCNH2ALDH1A1TSHRKDM4ETDP1
SCHEMBL682709 0.78 MAPK1 (0.43) MAPK1MAPTNPSR1ALDH1A1KDM4E
SCHEMBL13588091 0.78 ALDH1A1 (0.37) KCNH2MAPTALDH1A1TSHRKDM4E
SCHEMBL10148397 0.78 TDP1 (0.37) KCNH2MAPTNPSR1ALDH1A1TSHR
SCHEMBL14258895 0.78 ALDH1A1 (0.47) MAPTALDH1A1TSHRTDP1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-7326513-B2 Positive working resist composition FUJIFILM CORPORATION (JP) 2008-02-05 US disclosed