Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DPP4 | P27487 | 13/20 | 0.41 |
| ▸ | DPP8 | Q6V1X1 | 2/20 | 0.35 |
| ▸ | DPP9 | Q86TI2 | 2/20 | 0.35 |
| ▸ | FAP | Q12884 | 1/20 | 0.35 |
| ▸ | PITRM1 | Q5JRX3 | 1/20 | 0.35 |
| ▸ | DPP7 | Q9UHL4 | 1/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.34 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28556200 | 0.91 | ALDH1A1 (0.36) | DPP4NPC1ALDH1A1 | |
| SCHEMBL4862776 | 0.86 | ALDH1A1 (0.33) | NPC1ALDH1A1 | |
| SCHEMBL7083721 | 0.85 | ALDH1A1 (0.41) | DPP4NPC1ALDH1A1 | |
| SCHEMBL4858009 | 0.84 | ALDH1A1 (0.32) | NPC1ALDH1A1 | |
| SCHEMBL5402455 | 0.83 | DPP4 (0.42) | DPP4DPP8DPP9FAPPITRM1 | |
| SCHEMBL15290896 | 0.78 | MEN1 (0.38) | CYP3A4ALDH1A1 | |
| SCHEMBL14632350 | 0.72 | DPP4 (0.38) | DPP4DPP8DPP9CYP3A4ALDH1A1 | |
| Acrylic Acid Methyl Ester SCHEMBL27973004 | 0.72 | GLA (0.40) | HSD11B1ALDH1A1 | |
| SCHEMBL28138310 | 0.71 | NPSR1 (0.46) | HSD11B1NPC1ALDH1A1 | |
| SCHEMBL6744403 | 0.71 | HSD11B1 (0.32) | DPP4PKMHSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1445266-A2 | Photoresist copolymer | Daicel Chemical Industries, Ltd. (JP) | 2004-08-11 | — | — | EP | disclosed |
| US-20030180662-A1 | Acid-sensitive compound and resin composition for photoresist | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-09-25 | — | — | US | disclosed |
| EP-1000924-A1 | ACID-SENSITIVE COMPOUND AND RESIN COMPOSITION FOR PHOTORESIST | Daichel Chemical Industries Ltd (JP) | 2000-05-17 | — | — | EP | disclosed |