Hydrochloric Acid

Hydrochloric Acid

SCHEMBL6829790

[C+]1=CC2Oc3ccccc3NC2C=C1.[Cl-]

nearest known ligand 0.33

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
PARP1 P09874 1/20 0.32
MEN1 O00255 1/20 0.30
LMNA P02545 1/20 0.30
MAPT P10636 1/20 0.30
KMT2A Q03164 1/20 0.30
NISCH Q9Y2I1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL172197 0.75 PARP1 (0.36) PARP1MEN1LMNAMAPTKMT2A
SCHEMBL8651078 0.63 GAA (0.57) PARP1MEN1LMNAMAPTKMT2A
SCHEMBL22133439 0.62
SCHEMBL22133445 0.62
SCHEMBL22131425 0.60 MAPT (0.37) PARP1MEN1LMNAMAPTKMT2A
SCHEMBL22134197 0.60 MAPT (0.37) PARP1MEN1LMNAMAPTKMT2A
SCHEMBL23722589 0.60 PARP1 (0.50) PARP1MEN1LMNAMAPTKMT2A
SCHEMBL6097831 0.60 PARP1 (0.50) PARP1MEN1LMNAMAPTKMT2A
SCHEMBL7063218 0.60 PARP1 (0.41) PARP1MEN1LMNAMAPTKMT2A
SCHEMBL6097826 0.60 PARP1 (0.41) PARP1MEN1LMNAMAPTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5909114-A Coulometric analysis method and a device therefor NAKANO VINEGAR CO., LTD. (JP) 1999-06-01 US claimed
WO-2020027024-A1 PHOTOSENSITIVE RESIN COMPOSITION, PLATING METHOD, AND METHOD FOR PRODUCING METAL PATTERN 三菱製紙株式会社 2020-02-06 WO disclosed
EP-1455740-A1 HAIR TREATMENT COMPOSITION COMPRISING COMPOSITE PARTICLES OF CLAY AND CHARGED ORGANIC MOLECULE Unilever Plc (GB) 2004-09-15 EP disclosed
WO-2003047541-A1 HAIR TREATMENT COMPOSITION COMPRISING COMPOSITE PARTICLES OF CLAY AND CHARGED ORGANIC MOLECULE UNILEVER PLC (GB) 2003-06-12 WO disclosed
WO-2002067882-A1 HAIR COLORANT IN THE FORM OF A CREAMY PERMANENT MOUSSE OR A STABLE FOAMED CREME COLORANT WELLA AKTIENGESELLSCHAFT (DE) 2002-09-06 WO disclosed
US-5909114-A Coulometric analysis method and a device therefor NAKANO VINEGAR CO., LTD. (JP) 1999-06-01 US disclosed
US-5790627-A Method and apparatus for observing a specimen using an X-ray microscope RESEARCH DEVELOPMENT CORP. (JP) 1998-08-04 US disclosed
US-5726565-A FOR QUANTITATIVE DETERMINATION OF A SAMPLE SUBSTANCE NAKANO VINEGAR CO., LTD. (JP) 1998-03-10 US disclosed
EP-0600607-A2 Coulometric analysis method and a device therefor NAKANO VINEGAR CO., LTD. (JP) 1994-06-08 EP disclosed