SCHEMBL19700522

SCHEMBL19700522

CCC(C)CC(=O)Oc1c(F)c(F)c(S(=O)(=O)O)c(F)c1F

nearest known ligand 0.40

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.40
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
CA7 P43166 1/20 0.31
CA14 Q9ULX7 1/20 0.31
FFAR1 O14842 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL682996 0.78 PKM (0.30)
SCHEMBL15294914 0.78 ALDH1A1 (0.38) CA1CA2CA7
SCHEMBL23228270 0.74 FABP3 (0.35) ELANECA1CA2
SCHEMBL16663905 0.73 DGKA (0.42) CA2CA7CA14
SCHEMBL16865900 0.72 ALDH1A1 (0.32) CA1CA2CA7
SCHEMBL10180501 0.72 CA1 (0.35) CA1CA2
SCHEMBL6124939 0.71 POLB (0.34) CA1CA2CA7
SCHEMBL27435323 0.71
SCHEMBL17735975 0.70
SCHEMBL9963769 0.70 ALDH1A1 (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170355795-A1 POLYMER, NEGATIVE RESIST COMPOSITION, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-12-14 US disclosed