SCHEMBL6833151

SCHEMBL6833151

COc1c(F)c(F)c(C2=CC(=O)NC2=O)c(F)c1F

nearest known ligand 0.35

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5171280 0.83
SCHEMBL6834885 0.77
SCHEMBL8090047 0.71
SCHEMBL28079947 0.70 CA1 (0.44) HSD17B10
SCHEMBL12424935 0.69 HSD17B10 (0.34) HSD17B10
SCHEMBL1711725 0.67 HSD17B10 (0.47) HSD17B10
SCHEMBL9587810 0.67 GSK3B (0.37)
SCHEMBL6283678 0.67 HDAC4 (0.44) HSD17B10
SCHEMBL12965347 0.65 HSD17B10 (0.45) HSD17B10
SCHEMBL9852640 0.64 CYP1A1 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6746722-B2 EXPOSING POLYMER AND PHOTOACID GENERATOR WITH A LIGHT OF 180 NM OR LESS WAVELENGTH, AND CONDUCTING BAKING AND DEVELOPMENT. NEC CORPORATION (JP) 2004-06-08 US disclosed
US-20030036618-A1 Fluorine-containing phenylmaleimide derivative, polymer, chemically amplified resist composition, and method for pattern formation using the composition NEC CORPORATION (JP) 2003-02-20 US disclosed