Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2D6 | P10635 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 2/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
| ▸ | ATM | Q13315 | 1/20 | 0.30 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Indene SCHEMBL6321226 | 0.85 | CYP2D6 (0.36) | CYP2D6CYP2C19MAPTLMNAKDM4E | |
| SCHEMBL6858822 | 0.85 | MAPT (0.41) | MAPTLMNAKDM4ENPC1MAPK1 | |
| Indene SCHEMBL546792 | 0.81 | CYP2D6 (0.39) | CYP2D6CYP2C19KDM4E | |
| Indene SCHEMBL6053387 | 0.81 | ELANE (0.37) | — | |
| Indene SCHEMBL6053428 | 0.80 | ELANE (0.39) | CYP2D6CYP2C19MAPTLMNAKDM4E | |
| Styrene SCHEMBL4143998 | 0.79 | MAPT (0.37) | CYP2C19MAPTLMNAKDM4ENPC1 | |
| Indene SCHEMBL6834156 | 0.79 | CYP2D6 (0.32) | CYP2D6CYP2C19 | |
| Indene SCHEMBL6835844 | 0.79 | MEN1 (0.39) | CYP2C19MAPTLMNANPC1RAB9A | |
| Indene SCHEMBL6053432 | 0.77 | MAPT (0.39) | CYP2D6CYP2C19MAPTLMNAKDM4E | |
| SCHEMBL6371474 | 0.75 | MAPT (0.33) | CYP2D6CYP2C19MAPTLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6746817-B2 | ACID LABILE GROUPS INCREASE ALKALI SOLUBILITY; HAVING INCREASED ALKALI DISSOLUTION RATE BEFORE AND AFTER RADIATION EXPOSURE, HIGH SENSITIVITY, HIGH RESOLUTION, AND ETCHING RESISTANCE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-06-08 | — | — | US | disclosed |
| US-20020081521-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-06-27 | — | — | US | disclosed |