Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2D6 | P10635 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 8/20 | 0.38 |
| ▸ | CA1 | P00915 | 2/20 | 0.38 |
| ▸ | TRIM24 | O15164 | 1/20 | 0.36 |
| ▸ | TRIM33 | Q9UPN9 | 1/20 | 0.36 |
| ▸ | CA12 | O43570 | 6/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | MIF | P14174 | 2/20 | 0.35 |
| ▸ | CA9 | Q16790 | 5/20 | 0.34 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.33 |
| ▸ | CDK4 | P11802 | 1/20 | 0.33 |
| ▸ | CCND1 | P24385 | 1/20 | 0.33 |
| ▸ | SIRT2 | Q8IXJ6 | 1/20 | 0.33 |
| ▸ | PARP1 | P09874 | 1/20 | 0.33 |
| ▸ | JUN | P05412 | 1/20 | 0.33 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.33 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Indene SCHEMBL15048613 | 0.89 | CYP2C19 (0.39) | CYP2D6CYP2C19CA2CA1TRPA1 | |
| Indene SCHEMBL29183448 | 0.88 | CA1 (0.43) | CYP2D6CYP2C19CA2CA1PARP1 | |
| Indene SCHEMBL1972484 | 0.88 | MAPT (0.35) | CYP2D6CYP2C19CA2CA1NFE2L2 | |
| Indene SCHEMBL15048570 | 0.85 | RELA (0.40) | CYP2D6CYP2C19KDM4ETRPA1NFKB1 | |
| Indene SCHEMBL6053428 | 0.82 | ELANE (0.39) | CYP2D6CYP2C19KDM4E | |
| Indene SCHEMBL6834259 | 0.81 | CYP2D6 (0.36) | CYP2D6CYP2C19KDM4E | |
| Indene SCHEMBL6053432 | 0.81 | MAPT (0.39) | CYP2D6CYP2C19KDM4EALDH1A1 | |
| Indene SCHEMBL6321226 | 0.81 | CYP2D6 (0.36) | CYP2D6CYP2C19KDM4ECDK4CCND1 | |
| Indene SCHEMBL357035 | 0.81 | CYP2D6 (0.39) | CYP2D6CYP2C19CA2CA1PARP1 | |
| Indene SCHEMBL2568213 | 0.80 | KDM4E (0.32) | CYP2D6CYP2C19KDM4EALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8110335-B2 | Resist patterning process and manufacturing photo mask | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-02-07 | — | — | US | disclosed |
| EP-1783551-B1 | Resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2010-04-14 | — | — | EP | disclosed |
| US-20100009271-A1 | Resist patterning process and manufacturing photo mask | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2010-01-14 | — | — | US | disclosed |
| US-7618763-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-17 | — | — | US | disclosed |
| US-7501223-B2 | Polymer, resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-03-10 | — | — | US | disclosed |
| US-20080090179-A1 | Novel polymer, resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-04-17 | — | — | US | disclosed |
| US-20070105042-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-10 | — | — | US | disclosed |
| EP-1783551-A2 | Resist composition and patterning process | Shinetsu Chemical Co., Ltd. (JP) | 2007-05-09 | — | — | EP | disclosed |
| US-20060166133-A1 | Negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-07-27 | — | — | US | disclosed |
| US-6861198-B2 | Negative resist material and pattern formation method using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-01 | — | — | US | disclosed |
| US-20040023151-A1 | Negative resist material and pattern formation method using the same | SHIN-ETSU CHEMICAL CO., LTD. | 2004-02-05 | — | — | US | disclosed |