SCHEMBL683435

SCHEMBL683435

CCCCCCCCCCCCOCCOC(C)OC

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTT P42858 2/20 0.50
MEN1 O00255 1/20 0.50
THRB P10828 1/20 0.50
KMT2A Q03164 1/20 0.50
MAPT P10636 1/20 0.50
PRKD3 O94806 1/20 0.42
PRKCG P05129 1/20 0.42
PRKCB P05771 1/20 0.42
PRKCA P17252 1/20 0.42
PRKCH P24723 1/20 0.42
PRKCI P41743 1/20 0.42
PRKCE Q02156 1/20 0.42
PRKCQ Q04759 1/20 0.42
PRKCZ Q05513 1/20 0.42
PRKCD Q05655 1/20 0.42
PRKD1 Q15139 1/20 0.42
LPAR1 Q92633 8/20 0.41
LPAR3 Q9UBY5 8/20 0.41
LPAR2 Q9HBW0 4/20 0.41
LPAR6 P43657 3/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4580487 0.87 DNM1 (0.48) HTTMEN1THRBKMT2APRKD3
SCHEMBL27629301 0.87 DNM1 (0.48) HTTMEN1THRBKMT2APRKD3
SCHEMBL3502859 0.87 DNM1 (0.48) HTTMEN1THRBKMT2APRKD3
SCHEMBL15160848 0.85 DNM1 (0.45) PRKD3PRKCGPRKCBPRKCAPRKCH
SCHEMBL11259005 0.84 PRKD3 (0.42) HTTMEN1THRBKMT2AMAPT
SCHEMBL15384170 0.83 HSD17B10 (0.39) TDP1
SCHEMBL15384169 0.83 HSD17B10 (0.39) TDP1
SCHEMBL14739051 0.83 MEN1 (0.34) HTTMEN1THRBKMT2AMAPT
SCHEMBL1987972 0.82 LMNA (0.32)
SCHEMBL1525776 0.82 HTT (0.52) HTTMEN1THRBKMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
WO-2010150917-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2010-12-29 WO disclosed