SCHEMBL683547

SCHEMBL683547

CCC(C)c1ccc(O)c(O)c1

nearest known ligand 0.69

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 6/20 0.69
GAA P10253 3/20 0.69
ALDH1A1 P00352 3/20 0.69
ALOX15 P16050 2/20 0.69
HPGD P15428 2/20 0.69
USP2 O75604 1/20 0.69
PKM P14618 1/20 0.69
KDM4E B2RXH2 10/20 0.55
TDP1 Q9NUW8 8/20 0.55
MAPK1 P28482 5/20 0.55
HDAC4 P56524 1/20 0.55
HDAC2 Q92769 1/20 0.55
HDAC8 Q9BY41 1/20 0.55
SHBG P04278 1/20 0.55
ADRB2 P07550 6/20 0.54
PTGS2 P35354 2/20 0.54
OPRK1 P41145 1/20 0.54
SLC6A3 Q01959 1/20 0.54
MAPT P10636 8/20 0.52
RECQL P46063 5/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Butane SCHEMBL27803637 0.96 HSD17B10 (0.65) HSD17B10GAAALDH1A1ALOX15HPGD
SCHEMBL339877 0.87 GAA (0.63) HSD17B10GAAALDH1A1ALOX15HPGD
SCHEMBL487428 0.85 GAA (0.67) HSD17B10GAAALDH1A1ALOX15HPGD
SCHEMBL28161630 0.85 GAA (0.67) HSD17B10GAAALDH1A1ALOX15HPGD
SCHEMBL2740763 0.84 USP2 (0.56) HSD17B10GAAALDH1A1ALOX15HPGD
SCHEMBL3399797 0.83 GAA (0.59) HSD17B10GAAALDH1A1ALOX15HPGD
SCHEMBL14154101 0.83 GAA (0.59) HSD17B10GAAALDH1A1ALOX15HPGD
SCHEMBL29663703 0.83 GAA (0.59) HSD17B10GAAALDH1A1ALOX15HPGD
SCHEMBL97663 0.83 GAA (0.65) HSD17B10GAAALDH1A1ALOX15HPGD
SCHEMBL18879821 0.83 HSD17B10 (0.50) HSD17B10GAAALDH1A1ALOX15HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 223 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2020656-B1 OPTICAL DISK AND ULTRAVIOLET-CURABLE COMPOSITION FOR OPTICAL DISK DAINIPPON INK & CHEMICALS (JP) 2012-11-21 EP claimed
CN-101449325-B Optical disk and ultraviolet-curable composition for optical disk DAINIPPON INK & CHEMICALS 2011-02-16 CN claimed
US-20090207723-A1 OPTICAL DISC AND ULTRAVIOLET-CURABLE COMPOSITION FOR OPTICAL DISC DIC CORPORATION (JP) 2009-08-20 US claimed
CN-101449325-A Optical disk and ultraviolet-curable composition for optical disk DAINIPPON INK & CHEMICALS (JP) 2009-06-03 CN claimed
EP-2020656-A1 OPTICAL DISK AND ULTRAVIOLET-CURABLE COMPOSITION FOR OPTICAL DISK DIC Corporation (JP) 2009-02-04 EP claimed
US-20070036935-A1 Optical disk DAINIPPON INK AND CHEMICALS, INC., (JP) 2007-02-15 US claimed
CN-1860536-A Optical disk DAINIPPON INK & CHEMICALS (JP) 2006-11-08 CN claimed
EP-1669989-A1 OPTICAL DISK DAINIPPON INK AND CHEMICALS, INC. (JP) 2006-06-14 EP claimed
US-4196112-A ADDUCT OF A BUTADIENE POLYMER AN A,B-ACID, A CARBOCYCLIC ALCOHOL GELATION INHIBITOR, A HYDROPHILIC SOLVENT, A NEUTRALIZER NIPPON OIL CO., LTD. (JP) 1980-04-01 US claimed
US-4175068-A ADDUCT OF BUTADIENE AND UNSATURATED DICARBOXYLIC ACID, NEUTRALIZER NIPPON OIL CO., LTD. (JP) 1979-11-20 US claimed
US-20240241440-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed
US-20240241444-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2024-07-18 US disclosed
US-20240241441-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed
US-12032290-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-07-09 US disclosed
US-11840503-B2 Salt, acid generator, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-12-12 US disclosed
US-4176109-A CORROSION RESISTANCE, IMPACT RESISTANCE, ADHESIONN; ADDUCT OF BUTAC SOLVENT, NEUTRALIZER NIPPON OIL CO., LTD. (JP) 1979-11-27 US disclosed
US-4175068-A ADDUCT OF BUTADIENE AND UNSATURATED DICARBOXYLIC ACID, NEUTRALIZER NIPPON OIL CO., LTD. (JP) 1979-11-20 US disclosed
US-4171308-A ADDUCT OF A BUTADIENE POLYMER AND AN A,B-UNSATURATED CARBOXY ACID COMPOUND, NEUTRALIZED NIPPON OIL CO. LTD. (JP) 1979-10-16 US disclosed
US-4145501-A ADDUCT OF A LOW MOLECULAR WEIGHT BUTADIENE POLYMER AND AN UNSATURATED DICARBOXYLIC ACID COMPOUND, CORROSION RESISTANT, ADHESION, IMPACT RESISTANT NIPPON OIL CO., LTD. (JP) 1979-03-20 US disclosed
US-3952023-A Method for preparing adduct of butadiene polymer or copolymer and α, β-ethylenically unsaturated dicarboxylic acid compound NIPPON OIL COMPANY LTD. (JA) 1976-04-20 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11840503-B2 Salt, acid generator, resist composition and method for producing resist pattern RER1, H1-0, CA7 HSD17B10 1134/4885GAA 4362/4885ALDH1A1 2235/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.