Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 4/20 | 0.65 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.65 |
| ▸ | USP2 | O75604 | 1/20 | 0.65 |
| ▸ | PKM | P14618 | 1/20 | 0.65 |
| ▸ | HPGD | P15428 | 1/20 | 0.65 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.65 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.65 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.51 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.51 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.51 |
| ▸ | ESR1 | P03372 | 6/20 | 0.47 |
| ▸ | ESR2 | Q92731 | 5/20 | 0.47 |
| ▸ | AR | P10275 | 3/20 | 0.47 |
| ▸ | TP53 | P04637 | 2/20 | 0.45 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.45 |
| ▸ | RORC | P51449 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.44 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.44 |
| ▸ | CACNA1C | Q13936 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4401036 | 0.84 | TRPA1 (0.64) | GAAALDH1A1USP2PKMHPGD | |
| SCHEMBL683547 | 0.83 | HSD17B10 (0.69) | GAAALDH1A1USP2PKMHPGD | |
| SCHEMBL27776962 | 0.82 | ALDH1A1 (0.44) | GAAALDH1A1USP2PKMHPGD | |
| SCHEMBL29459520 | 0.82 | ESR1 (0.48) | GAAALDH1A1USP2PKMHPGD | |
| Methestrol SCHEMBL31290837 | 0.82 | SHBG (0.58) | GAAALDH1A1USP2PKMHPGD | |
| SCHEMBL529617 | 0.82 | ESR1 (0.48) | GAAALDH1A1USP2PKMHPGD | |
| SCHEMBL28161630 | 0.82 | GAA (0.67) | GAAALDH1A1USP2PKMHPGD | |
| Methestrol SCHEMBL351267 | 0.82 | SHBG (0.58) | GAAALDH1A1USP2PKMHPGD | |
| SCHEMBL6260738 | 0.82 | ESR1 (0.48) | GAAALDH1A1USP2PKMHPGD | |
| SCHEMBL487428 | 0.82 | GAA (0.67) | GAAALDH1A1USP2PKMHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 197 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230384674-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-11-30 | — | — | US | disclosed |
| US-20230221640-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-07-13 | — | — | US | disclosed |
| US-20230194987-A1 | PHOTORESIST POLYMER AND PHOTORESIST COMPOSITION INCLUDING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2023-06-22 | — | — | US | disclosed |
| US-20230185192-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-06-15 | — | — | US | disclosed |
| US-20230148344-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND | FUJIFILM CORPORATION (JP) | 2023-05-11 | — | — | US | disclosed |
| US-20230132693-A1 | RINSING LIQUID AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2023-05-04 | — | — | US | disclosed |
| WO-2022081807-A1 | SUBSTITUTED ACYL SULFONAMIDES FOR TREATING CANCER | THE BROAD INSTITUTE, INC. (US) | 2022-04-21 | — | — | WO | disclosed |
| US-10011576-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, electronic device, and compound | FUJIFILM CORPORATION (JP) | 2018-07-03 | — | — | US | disclosed |
| US-9958775-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blanks including actinic ray-sensitive or radiation-sensitive film, pattern forming method and photomask | FUJIFILM CORPORATION (JP) | 2018-05-01 | — | — | US | disclosed |
| US-20180087010-A1 | PRE-RINSING LIQUID, PRE-RINSING TREATMENT METHOD, AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2018-03-29 | — | — | US | disclosed |
| US-20070042291-A1 | Positive resist composition and a pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2007-02-22 | — | — | US | disclosed |
| US-7179579-B2 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7179579-B2 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| EP-1361241-B1 | Process for producing raw polycarbonate resin material and producing polycarbonate resin | IDEMITSU KOSAN CO (JP) | 2005-08-24 | — | — | EP | disclosed |
| CN-1622965-A | Aromatic polycarbonate resin, process for producing the same, molding material for optical parts, and optical parts | IDEMITSU KOSAN CO (JP) | 2005-06-01 | — | — | CN | disclosed |
| EP-1178068-B1 | PROCESSES FOR PRODUCING RAW POLYCARBONATE RESIN MATERIAL AND PRODUCING POLYCARBONATE RESIN | IDEMITSU KOSAN CO (JP) | 2005-05-18 | — | — | EP | disclosed |
| EP-1361241-A1 | Process for producing raw polycarbonate resin material and producing polycarbonate resin | IDEMITSU PETROCHEMICAL CO., LTD. (JP) | 2003-11-12 | — | — | EP | disclosed |
| EP-1178068-A1 | PROCESSES FOR PRODUCING RAW POLYCARBONATE RESIN MATERIAL AND PRODUCING POLYCARBONATE RESIN | IDEMITSU PETROCHEMICAL CO., LTD. (JP) | 2002-02-06 | — | — | EP | disclosed |
| US-3998804-A | PROCESS FOR COUPLING OF WATER-INSOLUBLE 2,4-DISUBSTITUTED PHENOLS WITH DIAZOTIZED O-NITROANILINES | CIBA-GEIGY CORPORATION (US) | 1976-12-21 | — | — | US | disclosed |
| US-3960928-A | BACTERICIDES, FUNGICIDES, STABILIZERS FOR PLASTICS | HOECHST AKTIENGESELLSCHAFT (DT) | 1976-06-01 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10011576-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, electronic device, and compound | RARA, RXRA, RARG | GAA 442/4885ALDH1A1 2784/4885USP2 2975/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.