Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1316622 | 0.80 | ALDH1A1 (0.41) | TSHRALDH1A1 | |
| SCHEMBL12431464 | 0.72 | TSHR (0.39) | TSHRALDH1A1 | |
| SCHEMBL11296269 | 0.72 | THRB (0.41) | TSHRALDH1A1 | |
| SCHEMBL3454512 | 0.71 | ALDH1A1 (0.39) | TSHRALDH1A1 | |
| SCHEMBL10051156 | 0.71 | ALDH1A1 (0.44) | TSHRALDH1A1 | |
| SCHEMBL25475956 | 0.70 | TSHR (0.47) | TSHRALDH1A1 | |
| SCHEMBL3267819 | 0.70 | TSHR (0.47) | TSHRALDH1A1 | |
| SCHEMBL30458048 | 0.70 | ALDH1A1 (0.39) | ALDH1A1 | |
| SCHEMBL365663 | 0.70 | SMN1; SMN2 (0.39) | TSHRALDH1A1 | |
| SCHEMBL3874486 | 0.69 | TSHR (0.39) | TSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6753126-B2 | FORMS PHOTORESIST PATTERN HAVING LOW DEPENDENCE ON AND GOOD ADHESION TO SUBSTRATE, HIGH TRANSPARENCY IN WAVELENGTH RANGE OF UV, X-RAYS RADIATION, STRONG RESISTANCE TO DRY ETCHING, EXCELLENCIES IN SENSITIVITY, RESOLUTION AND DEVELOPABILITY | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2004-06-22 | — | — | US | disclosed |
| EP-1262830-A1 | Polymer for chemically amplified resist and chemically amplified resist composition containing the same | Korea Kumho Petrochemical Co. Ltd. (KR) | 2002-12-04 | — | — | EP | disclosed |
| US-20020177068-A1 | Polymer for chemically amplified resist and chemically amplified resist composition containing the same | SK MATERIALS PERFORMANCE CO., LTD. (KR) | 2002-11-28 | — | — | US | disclosed |