SCHEMBL6839797

SCHEMBL6839797

CCCCOc1c2cc3ccccc3cc2c(OCCCC)c2cc3ccccc3cc12

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 2/20 0.50
TLR8 Q9NR97 2/20 0.46
L3MBTL1 Q9Y468 2/20 0.45
TDP1 Q9NUW8 2/20 0.45
GAA P10253 1/20 0.45
GPBAR1 Q8TDU6 2/20 0.44
CYSLTR2 Q9NS75 1/20 0.44
CYSLTR1 Q9Y271 1/20 0.44
CYP1A2 P05177 2/20 0.44
CYP2C9 P11712 2/20 0.44
CYP2C19 P33261 2/20 0.44
SLC2A1 P11166 1/20 0.43
CYP2D6 P10635 1/20 0.42
CYP19A1 P11511 1/20 0.42
KDM4E B2RXH2 2/20 0.41
NPC1 O15118 1/20 0.41
ALDH1A1 P00352 1/20 0.41
MAPT P10636 1/20 0.41
HPGD P15428 1/20 0.41
RAB9A P51151 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Anthracene SCHEMBL28075714 0.90 LTA4H (0.48) LTA4HTLR8L3MBTL1TDP1GAA
SCHEMBL29368652 0.86 SLC2A1 (0.48) LTA4HTLR8L3MBTL1TDP1GAA
SCHEMBL293401 0.86 SLC2A1 (0.48) LTA4HTLR8L3MBTL1TDP1GAA
SCHEMBL16673312 0.85 GAA (0.43) LTA4HTLR8L3MBTL1TDP1GAA
SCHEMBL29363526 0.83 LTA4H (0.52) LTA4HL3MBTL1TDP1GAACYP1A2
SCHEMBL442080 0.83 LTA4H (0.52) LTA4HL3MBTL1TDP1GAACYP1A2
SCHEMBL16745551 0.82 GAA (0.55) LTA4HTLR8L3MBTL1TDP1GAA
SCHEMBL520954 0.81 GAA (0.51) LTA4HTLR8L3MBTL1TDP1GAA
SCHEMBL23089937 0.81 TLR8 (0.46) LTA4HTLR8L3MBTL1TDP1GAA
SCHEMBL4109257 0.81 LTA4H (0.43) LTA4HL3MBTL1TDP1GAACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20040087676-A1 Film formation method SEIKO EPSON CORPORATION (JP) 2004-05-06 US disclosed
CN-1494171-A Film Forming method ������������ʽ���� 2004-05-05 CN disclosed