⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ammonia Solution, Strong SCHEMBL15994013 | 0.97 | MGLL (0.43) | — | |
| SCHEMBL29286972 | 0.97 | MGLL (0.43) | — | |
| SCHEMBL475320 | 0.91 | ADRA2A (0.52) | — | |
| SCHEMBL822152 | 0.86 | MGLL (0.52) | — | |
| SCHEMBL206255 | 0.86 | DGKA (0.56) | — | |
| SCHEMBL822230 | 0.85 | MGAM (0.48) | — | |
| SCHEMBL13414043 | 0.85 | ADRA2A (0.43) | — | |
| SCHEMBL821877 | 0.85 | MEN1 (0.52) | — | |
| SCHEMBL12565651 | 0.83 | DGKA (0.60) | — | |
| SCHEMBL8065894 | 0.83 | DGKA (0.60) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12032287-B2 | Resist material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-09 | — | — | US | disclosed |
| US-11685809-B2 | Phosphorus-containing polymers, and methods of producing thereof | NOVOMER, INC. (US) | 2023-06-27 | — | — | US | disclosed |
| US-11160899-B2 | Intraoperative uses of settable surgical compositions | ABYRX, INC. (US) | 2021-11-02 | — | — | US | disclosed |
| EP-3768742-A1 | SULFUR- AND PHOSPHORUS-CONTAINING POLYMERS, AND METHODS OF PRODUCING THEREOF | Novomer, Inc. (US) | 2021-01-27 | — | — | EP | disclosed |
| US-20210009753-A1 | SULFUR- AND PHOSPHORUS-CONTAINING POLYMERS, AND METHODS OF PRODUCING THEREOF | NOVOMER, INC. | 2021-01-14 | — | — | US | disclosed |
| EP-3706815-A1 | INTRAOPERATIVE USES OF SETTABLE SURGICAL COMPOSITIONS | Abyrx, Inc. (US) | 2020-09-16 | — | — | EP | disclosed |
| WO-2019183284-A1 | SULFUR- AND PHOSPHORUS-CONTAINING POLYMERS, AND METHODS OF PRODUCING THEREOF | NOVOMER, INC. (US) | 2019-09-26 | — | — | WO | disclosed |
| US-20190134259-A1 | INTRAOPERATIVE USES OF SETTABLE SURGICAL COMPOSITIONS | ABYRX, INC. | 2019-05-09 | — | — | US | disclosed |
| CN-109152753-A | For treating/preventing dermopathic carboxylic acid | 拥护者生物技术有限公司 | 2019-01-04 | — | — | CN | disclosed |
| CN-109152755-A | Carboxylic acid for children's early stage application | 拥护者生物技术有限公司 | 2019-01-04 | — | — | CN | disclosed |
| US-9177921-B2 | Manufacturing method of semiconductor device | FUJIFILM CORPORATION (JP) | 2015-11-03 | — | — | US | disclosed |
| US-20150099228-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-04-09 | — | — | US | disclosed |
| US-20150099228-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-04-09 | — | — | US | disclosed |
| US-20140322893-A1 | MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2014-10-30 | — | — | US | disclosed |
| US-20140318697-A1 | MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2014-10-30 | — | — | US | disclosed |
| US-20110146516-A1 | METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2011-06-23 | — | — | US | disclosed |
| US-20110017084-A1 | IMMERSION TYPE AUTOMATIC DEVELOPING APPARATUS FOR LITHOGRAPHIC PRINTING PLATE AND AUTOMATIC DEVELOPING METHOD | FUJIFILM CORPORATION (JP) | 2011-01-27 | — | — | US | disclosed |
| US-20110020757-A1 | METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2011-01-27 | — | — | US | disclosed |
| US-20040236064-A1 | Plastic lens material, plastic lens composition, plastic lens obtained by curing the composition and process for producing the plastic lens | SHOWA DENKO K.K. (JP) | 2004-11-25 | — | — | US | disclosed |
| WO-2003010566-A2 | PLASTIC LENS MATERIAL, PLASTIC LENS COMPOSITION, PLASTIC LENS OBTAINED BY CURING THE COMPOSITION AND PROCESS FOR PRODUCING THE PLASTIC LENS | SHOWA DENKO K. K. (JP) | 2003-02-06 | — | — | WO | disclosed |