Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9888612 | 0.98 | TSHR (0.34) | TSHRALDH1A1TP53CYP1A2 | |
| SCHEMBL1518175 | 0.80 | TSHR (0.43) | TSHRALDH1A1TP53CYP1A2 | |
| SCHEMBL8030278 | 0.79 | TSHR (0.41) | TSHRALDH1A1TP53 | |
| SCHEMBL8841262 | 0.78 | TSHR (0.36) | TSHRALDH1A1TP53 | |
| SCHEMBL29269904 | 0.76 | ALDH1A1 (0.52) | TSHRALDH1A1TP53 | |
| SCHEMBL98864 | 0.76 | TSHR (0.46) | TSHRALDH1A1TP53 | |
| SCHEMBL20887449 | 0.76 | SLC1A3 (0.35) | TSHRCYP1A2 | |
| Hydrochloric Acid SCHEMBL7722330 | 0.74 | TSHR (0.44) | TSHRALDH1A1TP53 | |
| SCHEMBL12661385 | 0.74 | SLC1A3 (0.34) | TSHR | |
| SCHEMBL10460142 | 0.74 | TSHR (0.50) | TSHRALDH1A1TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110201563-A | A kind of preparation method of chlorine-resistant anti-pollution polyamide reverse osmose membrane | 武汉纳霏膜科技有限公司 | 2019-09-06 | — | — | CN | claimed |
| CN-110201563-A | A kind of preparation method of chlorine-resistant anti-pollution polyamide reverse osmose membrane | 武汉纳霏膜科技有限公司 | 2019-09-06 | — | — | CN | disclosed |
| US-6770418-B2 | ACID-CATALYZED POSITIVE RESIST COMPOSITIONS SUITABLE FOR BILAYER OR MULTILAYER LITHOGRAPHIC APPLICATIONS ARE ENABLED BY THE USE OF A COMBINATION OF (A) AN ACID-SENSITIVE IMAGING POLYMER, (B) A RADIATION SENSITIVE ACID GENERATOR, AND (C) A | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-08-03 | — | — | US | disclosed |
| US-20030124453-A1 | Positive resist compositions containing non-polymeric silicon aditives | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2003-07-03 | — | — | US | disclosed |
| US-6444091-B1 | MIXING PULPS WITH POLYAMIDES OR IN COMBINATION WITH COAGULANTS, FLOCCULANTS AND/OR PARTICLES; EFFICIENCY | NALCO CHEMICAL COMPANY | 2002-09-03 | — | — | US | disclosed |
| WO-2002052102-A2 | STRUCTURALLY RIGID NONIONIC AND ANIONIC POLYMERS AS RETENTION AND DRAINAGE AIDS IN PAPERMAKING | ONDEO NALCO COMPANY (US) | 2002-07-04 | — | — | WO | disclosed |