Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 3/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.38 |
| ▸ | APAF1 | O14727 | 1/20 | 0.34 |
| ▸ | TDP2 | O95551 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 4/20 | 0.33 |
| ▸ | S100A4 | P26447 | 2/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | PTPN22 | Q9Y2R2 | 1/20 | 0.33 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.33 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.33 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.33 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.33 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.32 |
| ▸ | BACE1 | P56817 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Phenol SCHEMBL28963693 | 1.00 | MEN1 (0.38) | MEN1KMT2AKDM4EAPAF1TDP2 | |
| SCHEMBL1412039 | 0.93 | S100A4 (0.38) | MEN1KMT2AKDM4EAPAF1TDP2 | |
| SCHEMBL1412040 | 0.93 | S100A4 (0.38) | MEN1KMT2AKDM4EAPAF1TDP2 | |
| Hydrochloric Acid SCHEMBL5467571 | 0.91 | S100A4 (0.37) | MEN1KMT2AKDM4EAPAF1TDP2 | |
| SCHEMBL5246311 | 0.91 | S100A4 (0.37) | MEN1KMT2AKDM4EAPAF1TDP2 | |
| SCHEMBL3792513 | 0.80 | MEN1 (0.35) | MEN1KMT2AKDM4EAPAF1TDP2 | |
| SCHEMBL28717273 | 0.79 | BCL2 (0.40) | MEN1KMT2AKDM4EAPAF1MAPT | |
| SCHEMBL28721728 | 0.79 | HDAC1 (0.36) | MEN1KMT2AKDM4EAPAF1MAPT | |
| SCHEMBL6848561 | 0.79 | S100A4 (0.39) | MEN1KMT2AKDM4EAPAF1TDP2 | |
| SCHEMBL3147191 | 0.77 | S100A4 (0.42) | MEN1KMT2AKDM4EAPAF1TDP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8563215-B2 | Diazonaphthoquinonesulfonic acid bisphenol derivative useful in photo lithographic sub micron patterning and a process for preparation thereof | COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) | 2013-10-22 | — | — | US | disclosed |
| US-8563215-B2 | Diazonaphthoquinonesulfonic acid bisphenol derivative useful in photo lithographic sub micron patterning and a process for preparation thereof | COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) | 2013-10-22 | — | — | US | disclosed |
| US-8563215-B2 | Diazonaphthoquinonesulfonic acid bisphenol derivative useful in photo lithographic sub micron patterning and a process for preparation thereof | COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) | 2013-10-22 | — | — | US | disclosed |
| EP-2137140-B1 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | COUNCIL SCIENT IND RES (IN) | 2010-11-10 | — | — | EP | disclosed |
| EP-2137140-B1 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | COUNCIL SCIENT IND RES (IN) | 2010-11-10 | — | — | EP | disclosed |
| US-20100081084-A1 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) | 2010-04-01 | — | — | US | disclosed |
| US-20100081084-A1 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) | 2010-04-01 | — | — | US | disclosed |
| EP-2137140-A2 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | Council of Scientific&Industrial Research (IN) | 2009-12-30 | — | — | EP | disclosed |
| EP-2137140-A2 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | Council of Scientific&Industrial Research (IN) | 2009-12-30 | — | — | EP | disclosed |
| WO-2008117308-A4 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | COUNCIL SCIENT IND RES (IN) | 2009-01-08 | — | — | WO | disclosed |
| WO-2008117308-A3 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | COUNCIL SCIENT IND RES (IN) | 2008-11-13 | — | — | WO | disclosed |
| WO-2008117308-A2 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) | 2008-10-02 | — | — | WO | disclosed |
| WO-2008117308-A2 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) | 2008-10-02 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100081084-A1 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | NRP1, NR4A1, SNX1 | MEN1 2823/4885KMT2A 1332/4885KDM4E 1524/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.