SCHEMBL6849500

SCHEMBL6849500

C=C(OC(=C)[Si](OC)(OC)OC)[Si](OC)(OC)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL315166 0.72
SCHEMBL4061281 0.71 ALDH1A1 (0.33)
Ethylene SCHEMBL28228274 0.69
SCHEMBL432980 0.69 ALDH1A1 (0.32)
SCHEMBL28119907 0.69
SCHEMBL7799566 0.67
SCHEMBL29044804 0.67
SCHEMBL8841144 0.67
SCHEMBL25196844 0.65
SCHEMBL28861374 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6794469-B2 FILM FORMING COMPOSITION CONTAINING THE COPOLYMER. AN ANTI-REFLECTION FILM HAVING A LOW-REFRACTIVE-INDEX LAYER CONTAINING THE COPOLYMER. AN ANTI-REFLECTION FILM HAVING THE ABOVE ANTI-REFLECTION FILM ON A TRANSPARENT SUPPORT. AN IMAGE FUJI PHOTO FILM CO., LTD. (JP) 2004-09-21 US disclosed
US-20030120008-A1 Fluorine-containing copolymer, composition for forming a film, anti-reflection film, and image display device FUJIFILM CORPORATION (JP) 2003-06-26 US disclosed