SCHEMBL6859010

SCHEMBL6859010

CCC12CC3CC(CC(C3)C1OC(=O)C(F)=C(F)F)C2

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.31
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL453582 0.81 EPHX2 (0.31) ALDH1A1LMNA
SCHEMBL6749784 0.79 EPHX2 (0.30) ALDH1A1
SCHEMBL26078962 0.78 SCN1A (0.40) ALDH1A1LMNA
SCHEMBL5917750 0.77 EPHX2 (0.32) ALDH1A1LMNA
SCHEMBL548176 0.77 ALDH1A1 (0.32) ALDH1A1LMNA
SCHEMBL451377 0.75 ALDH1A1 (0.31) ALDH1A1LMNA
SCHEMBL13447548 0.74 ALDH1A1 (0.31) ALDH1A1LMNA
SCHEMBL5917727 0.73 ATM (0.44) ALDH1A1LMNA
SCHEMBL14860021 0.72 MEN1 (0.30)
SCHEMBL12346676 0.72 ALDH1A1 (0.33) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6835524-B2 Polymers, chemical amplification resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-12-28 US disclosed
US-20010018162-A1 Novel polymers, chemical amplification resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-08-30 US disclosed