Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 2/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 2/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3053351 | 0.89 | MEN1 (0.33) | EPHX2ALDH1A1MEN1KMT2AL3MBTL1 | |
| SCHEMBL12346676 | 0.87 | ALDH1A1 (0.33) | EPHX2ALDH1A1 | |
| SCHEMBL3057478 | 0.86 | TSHR (0.35) | EPHX2ALDH1A1MEN1KMT2AL3MBTL1 | |
| SCHEMBL19052008 | 0.86 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL6749784 | 0.86 | EPHX2 (0.30) | EPHX2ALDH1A1 | |
| SCHEMBL214611 | 0.85 | ALDH1A1 (0.32) | ALDH1A1KMT2A | |
| SCHEMBL5917750 | 0.83 | EPHX2 (0.32) | EPHX2ALDH1A1LMNAMEN1KMT2A | |
| SCHEMBL6859010 | 0.81 | ALDH1A1 (0.31) | ALDH1A1LMNA | |
| SCHEMBL108706 | 0.80 | ALDH1A1 (0.33) | ALDH1A1 | |
| SCHEMBL450766 | 0.80 | ALDH1A1 (0.31) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 81 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115160495-A | Photoresist film-forming resin containing maleimide structure and preparation method thereof | 四川华造宏材科技有限公司 | 2022-10-11 | — | — | CN | claimed |
| CN-1171125-C | Copolymer with nitrile and alcyl group and photoresist composite containing the copolymer | ϣ | 2004-10-13 | — | — | CN | claimed |
| US-12578644-B2 | Upper film-forming composition and method for producing phase-separated pattern | NISSAN CHEMICAL CORPORATION (JP) | 2026-03-17 | — | — | US | disclosed |
| EP-4267708-B1 | THERMALLY RESPONSIVE BRUSH POLYMERS HAVING A COPOLYMER BACKBONE AND COPOLYMER ARMS | INFINEUM INT LTD (GB) | 2025-07-02 | — | — | EP | disclosed |
| US-12281203-B2 | Thermally responsive brush polymers having a copolymer backbone and copolymer arms | INFINEUM INTERNATIONAL LIMITED (GB) | 2025-04-22 | — | — | US | disclosed |
| US-20240309155-A1 | Thermally Responsive Brush Polymers Having a Copolymer Backbone and Copolymer Arms | INFINEUM INTERNATIONAL LIMITED (GB) | 2024-09-19 | — | — | US | disclosed |
| CN-115160495-B | Photoresist film-forming resin containing maleimide structure and preparation method thereof | 四川华造宏材科技有限公司 | 2024-05-14 | — | — | CN | disclosed |
| US-20240124632-A1 | Method for Producing Fluorine-Containing Polymer and Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-04-18 | — | — | US | disclosed |
| CN-114560768-B | Synthesis method of acrylic resin monomer for 193nm photoresist | 河北凯诺中星科技有限公司 | 2024-03-15 | — | — | CN | disclosed |
| US-20240043593-A1 | Fluorine-Containing Polymer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-02-08 | — | — | US | disclosed |
| EP-4267708-A1 | THERMALLY RESPONSIVE BRUSH POLYMERS HAVING A COPOLYMER BACKBONE AND COPOLYMER ARMS | Infineum International Limited (GB) | 2023-11-01 | — | — | EP | disclosed |
| US-6902772-B2 | Silicon-containing polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-06-07 | — | — | US | disclosed |
| CN-1184536-C | Chemically enhanced possitive photoetching compositions | SUMITOMO CHEMICAL CO (JP) | 2005-01-12 | — | — | CN | disclosed |
| WO-2004050728-A2 | METHOD OF PRODUCING (METH) ACRYLIC ACID DERIVATIVE POLYMER FOR RESIST | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-06-17 | — | — | WO | disclosed |
| US-20040006191-A1 | Silicon-containing polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO. LTD. (JP) | 2004-01-08 | — | — | US | disclosed |
| US-20030118934-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-06-26 | — | — | US | disclosed |
| EP-1308782-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-05-07 | — | — | EP | disclosed |
| US-20020168581-A1 | Silicon-containing polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-11-14 | — | — | US | disclosed |
| EP-1236745-A2 | Silicon-containing polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-09-04 | — | — | EP | disclosed |
| CN-1261171-A | Chemically enhanced possitive photoetching compositions | SUMITOMO CHEMICAL CO (JP) | 2000-07-26 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12578644-B2 | Upper film-forming composition and method for producing phase-separated pattern | SMCHD1, SSU72, TPR | EPHX2 1483/4885ALDH1A1 2401/4885LMNA 606/4885 |
| US-20240124632-A1 | Method for Producing Fluorine-Containing Polymer and Composition | PFAS, AFF2, AFF1 | EPHX2 328/4885ALDH1A1 865/4885LMNA 2606/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.