SCHEMBL451377

SCHEMBL451377

C=CC(=O)OC1C2CC3CC(C2)CC1(CC)C3

nearest known ligand 0.31

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.31
LMNA P02545 2/20 0.31
THRB P10828 2/20 0.31
HTT P42858 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
HPGD P15428 1/20 0.30
TSHR P16473 1/20 0.30
MEN1 O00255 2/20 0.30
KMT2A Q03164 2/20 0.30
L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21247654 0.89 MEN1 (0.33) ALDH1A1THRBHPGDTSHRMEN1
SCHEMBL12346677 0.87 ALDH1A1 (0.35) ALDH1A1LMNATHRBHTTSMN1; SMN2
SCHEMBL27760574 0.86 TSHR (0.36) ALDH1A1THRBHPGDTSHRMEN1
SCHEMBL216846 0.85 ALDH1A1 (0.32) ALDH1A1SMN1; SMN2KMT2A
SCHEMBL5917727 0.83 ATM (0.44) ALDH1A1LMNATHRBHTTSMN1; SMN2
SCHEMBL19619432 0.82
SCHEMBL284285 0.80
SCHEMBL453582 0.79 EPHX2 (0.31) ALDH1A1LMNAMEN1KMT2AL3MBTL1
SCHEMBL26078962 0.79 SCN1A (0.40) ALDH1A1LMNATSHRMEN1KMT2A
SCHEMBL454651 0.78 THRB (0.30) ALDH1A1LMNATHRBHTTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4267708-B1 THERMALLY RESPONSIVE BRUSH POLYMERS HAVING A COPOLYMER BACKBONE AND COPOLYMER ARMS INFINEUM INT LTD (GB) 2025-07-02 EP disclosed
US-12281203-B2 Thermally responsive brush polymers having a copolymer backbone and copolymer arms INFINEUM INTERNATIONAL LIMITED (GB) 2025-04-22 US disclosed
CN-112285998-B Method for forming pattern using antireflective coating composition comprising photoacid generator 罗门哈斯电子材料有限责任公司 2025-01-03 CN disclosed
US-20240309155-A1 Thermally Responsive Brush Polymers Having a Copolymer Backbone and Copolymer Arms INFINEUM INTERNATIONAL LIMITED (GB) 2024-09-19 US disclosed
US-20240124632-A1 Method for Producing Fluorine-Containing Polymer and Composition CENTRAL GLASS COMPANY, LIMITED (JP) 2024-04-18 US disclosed
CN-114560768-B Synthesis method of acrylic resin monomer for 193nm photoresist 河北凯诺中星科技有限公司 2024-03-15 CN disclosed
US-20240043593-A1 Fluorine-Containing Polymer CENTRAL GLASS COMPANY, LIMITED (JP) 2024-02-08 US disclosed
EP-4267708-A1 THERMALLY RESPONSIVE BRUSH POLYMERS HAVING A COPOLYMER BACKBONE AND COPOLYMER ARMS Infineum International Limited (GB) 2023-11-01 EP disclosed
US-11597696-B2 Method for purifying polymerizable fluoromonomer by distillation CENTRAL GLASS COMPANY, LIMITED (JP) 2023-03-07 US disclosed
CN-115729035-A Transfer film for vapor deposition mask formation and method for manufacturing vapor deposition mask 富士胶片株式会社 2023-03-03 CN disclosed
US-8663903-B2 Top coating composition CENTRAL GLASS COMPANY, LIMITED (JP) 2014-03-04 US disclosed
US-8592508-B2 Top coat composition CENTRAL GLASS COMPANY, LIMITED (JP) 2013-11-26 US disclosed
US-20130216960-A1 Water Repellent Additive for Immersion Resist CENTRAL GLASS COMPANY, LIMITED (JP) 2013-08-22 US disclosed
US-20120077126-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method CENTRAL GLASS COMPANY, LIMITED (JP) 2012-03-29 US disclosed
US-20120064459-A1 Water Repellent Additive for Immersion Resist CENTRAL GLASS COMPANY, LIMITED (JP) 2012-03-15 US disclosed
US-20120040294-A1 Top Coating Composition CENTRAL GLASS COMPANY, LIMITED (JP) 2012-02-16 US disclosed
US-20110244188-A1 Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation Central Glass Company , Limited (JP) 2011-10-06 US disclosed
US-20110245395-A1 Top Coat Composition CENTRAL GLASS COMPANY, LIMITED 2011-10-06 US disclosed
US-20060009583-A1 Method of producing (meth) acrylic acid derivative polymer for resist TOKYO OHKA KOGYO CO., LTD. (JP) 2006-01-12 US disclosed
WO-2004050728-A2 METHOD OF PRODUCING (METH) ACRYLIC ACID DERIVATIVE POLYMER FOR RESIST TOKYO OHKA KOGYO CO., LTD. (JP) 2004-06-17 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110244188-A1 Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation AFF1, FRG1, AFF2 ALDH1A1 2056/4885LMNA 1507/4885THRB 3016/4885
US-11597696-B2 Method for purifying polymerizable fluoromonomer by distillation AFF1, AFF4, AFF2 ALDH1A1 950/4885LMNA 1385/4885THRB 1246/4885
US-20120077126-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method FRG1, AFF2, FBXL19 ALDH1A1 4430/4885LMNA 1234/4885THRB 3872/4885
US-20240124632-A1 Method for Producing Fluorine-Containing Polymer and Composition PFAS, AFF2, AFF1 ALDH1A1 865/4885LMNA 2606/4885THRB 2068/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.