SCHEMBL6860899

SCHEMBL6860899

CC(C)COC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.39

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 2/20 0.39
SLC22A2 O15244 1/20 0.38
SLC47A1 Q96FL8 1/20 0.38
MAPT P10636 1/20 0.37
EPHX2 P34913 3/20 0.34
KMT2A Q03164 2/20 0.33
MEN1 O00255 1/20 0.33
ALDH1A1 P00352 1/20 0.33
HTT P42858 1/20 0.33
GRIN2D O15399 3/20 0.31
GRIN3B O60391 3/20 0.31
GRIN1 Q05586 3/20 0.31
GRIN2A Q12879 3/20 0.31
GRIN2B Q13224 3/20 0.31
GRIN2C Q14957 3/20 0.31
GRIN3A Q8TCU5 3/20 0.31
GAA P10253 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11637984 0.83 SLC22A2 (0.45) NPSR1SLC22A2SLC47A1MAPTKMT2A
SCHEMBL14461602 0.79 NPSR1 (0.34) NPSR1SLC22A2SLC47A1MAPTEPHX2
SCHEMBL10228455 0.79 PKM (0.39) EPHX2ALDH1A1
SCHEMBL18826696 0.78
SCHEMBL24250782 0.75 GRIN2D (0.35) NPSR1SLC22A2SLC47A1MAPTKMT2A
SCHEMBL27941224 0.75 LMNA (0.38) NPSR1KMT2AMEN1ALDH1A1HTT
SCHEMBL19880288 0.74
SCHEMBL270387 0.73 NPSR1 (0.43) NPSR1SLC22A2SLC47A1EPHX2KMT2A
SCHEMBL4136805 0.72 ALDH1A1 (0.38) NPSR1KMT2AMEN1ALDH1A1HTT
SCHEMBL482480 0.71 ALDH1A1 (0.41) NPSR1MAPTEPHX2KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11852970-B2 Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-12-26 US disclosed
US-20180074406-A1 COMPOUND, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN USING IT MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2018-03-15 US disclosed
US-9897913-B2 Radiation-sensitive composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2018-02-20 US disclosed
US-6794528-B2 HEAT RESISTANCE, FLAME RETARDERS, STABILIZERS; REACTING DIALCOHOL COMPOUND WITH A PHOSPHYL OXYCHLORIDE COMPOUND DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2004-09-21 US disclosed
US-20030109736-A1 Phosphorus compound DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2003-06-12 US disclosed
EP-1277758-A1 PHOSPHORUS COMPOUND Daicel Chemical Industries, Ltd. (JP) 2003-01-22 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11852970-B2 Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin SLC39A11, CROCC, TERB1 NPSR1 4485/4885SLC22A2 3173/4885SLC47A1 355/4885
US-20180074406-A1 COMPOUND, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN USING IT RDX, SLC11A2, FBL NPSR1 1921/4885SLC22A2 3793/4885SLC47A1 2149/4885
US-20030109736-A1 Phosphorus compound NR4A1, POLL, NR0B1 NPSR1 375/4885SLC22A2 2511/4885SLC47A1 3065/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.