SCHEMBL6863288

SCHEMBL6863288

C=C(C)C(=O)OC(=O)c1ccccc1C(=O)OC(=O)C(C)O

nearest known ligand 0.44

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.44
ALDH1A1 P00352 4/20 0.44
CYP3A4 P08684 3/20 0.37
TDP1 Q9NUW8 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
ELANE P08246 1/20 0.36
TP53 P04637 1/20 0.35
MAPK1 P28482 1/20 0.35
LMNA P02545 1/20 0.34
ADRB2 P07550 3/20 0.33
ADRB1 P08588 3/20 0.33
ADRB3 P13945 3/20 0.33
HPGD P15428 1/20 0.33
NPC1 O15118 1/20 0.33
CA2 P00918 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2992730 0.87 TSHR (0.45) TSHRALDH1A1CYP3A4TDP1L3MBTL1
SCHEMBL5713064 0.84 ALDH1A1 (0.40) TSHRALDH1A1CYP3A4TDP1L3MBTL1
SCHEMBL2937590 0.80 ALDH1A1 (0.50) TSHRALDH1A1CYP3A4TDP1ELANE
Ethylene Glycol SCHEMBL4599267 0.80 TSHR (0.44) TSHRALDH1A1CYP3A4TDP1L3MBTL1
SCHEMBL27703462 0.80 ALDH1A1 (0.50) TSHRALDH1A1TDP1LMNAHPGD
SCHEMBL633205 0.79 TSHR (0.68) TSHRALDH1A1CYP3A4TDP1L3MBTL1
Ethane SCHEMBL16393958 0.79 ALDH1A1 (0.48) TSHRALDH1A1CYP3A4TDP1ELANE
SCHEMBL10528766 0.79 ALDH1A1 (0.49) TSHRALDH1A1CYP3A4TDP1L3MBTL1
SCHEMBL6863293 0.79 ALDH1A1 (0.49) TSHRALDH1A1CYP3A4MAPK1ADRB2
SCHEMBL6072620 0.77 TSHR (0.50) TSHRALDH1A1TDP1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6806032-B2 NEGATIVE-TYPE PHOTOSENSITIVE RESIN IS A PRODUCT OF MICHAEL ADDITION REACTION BETWEEN AN AMINO GROUP CONTAINING COMPOUND AND AN METH(ACRYLATED)POLYETHYLENE GLYCOL TOKYO OHKA KOGYO CO., LTD. (JP) 2004-10-19 US disclosed
US-20030170569-A1 Negative-type photosensitive resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 2003-09-11 US disclosed