SCHEMBL2992730

SCHEMBL2992730

C=C(C)C(=O)OC(=O)c1ccccc1C(=O)OC(=O)C(=C)C

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 8/20 0.45
ELANE P08246 1/20 0.43
ALDH1A1 P00352 8/20 0.42
CYP3A4 P08684 2/20 0.41
TDP1 Q9NUW8 2/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
LMNA P02545 4/20 0.39
TP53 P04637 1/20 0.39
MAPK1 P28482 1/20 0.39
HSD17B10 Q99714 3/20 0.38
CFTR P13569 1/20 0.38
KDM4E B2RXH2 4/20 0.37
NPC1 O15118 1/20 0.37
POLB P06746 1/20 0.37
ATM Q13315 1/20 0.37
ESR1 P03372 1/20 0.37
ITGB3 P05106 1/20 0.37
ITGA2B P08514 1/20 0.37
HMGB1 P09429 1/20 0.37
HPGD P15428 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene Glycol SCHEMBL4599267 0.93 TSHR (0.44) TSHRELANEALDH1A1CYP3A4TDP1
SCHEMBL2937590 0.93 ALDH1A1 (0.50) TSHRELANEALDH1A1CYP3A4TDP1
Ethane SCHEMBL16393958 0.91 ALDH1A1 (0.48) TSHRELANEALDH1A1CYP3A4TDP1
SCHEMBL27617441 0.89 NPC1 (0.44) TSHRELANELMNANPC1ESR1
SCHEMBL31424058 0.89 LMNA (0.56) TSHRELANEALDH1A1CYP3A4TDP1
SCHEMBL11339716 0.89 LMNA (0.56) TSHRELANEALDH1A1CYP3A4TDP1
Trimethylammonium SCHEMBL28327506 0.88 ALDH1A1 (0.45) TSHRELANEALDH1A1CYP3A4TDP1
SCHEMBL633205 0.88 TSHR (0.68) TSHRALDH1A1CYP3A4TDP1L3MBTL1
SCHEMBL6863288 0.87 TSHR (0.44) TSHRELANEALDH1A1CYP3A4TDP1
SCHEMBL5713064 0.87 ALDH1A1 (0.40) TSHRELANEALDH1A1CYP3A4TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105324103-B Nail coatings with enhanced adhesion 指甲创意设计股份有限公司 2018-07-20 CN claimed
CN-105324103-A Nail coatings with enhanced adhesion CREATIVE NAIL DESIGN INC 2016-02-10 CN claimed
JP-61144601-A None JP disclosed
JP-61127713-A None JP disclosed
CN-115354763-A Waterproof roll and preparation method thereof 荆门科顺新材料有限公司 2022-11-18 CN disclosed
CN-110317174-A Hydrogen barrier, hydrogen barrier film, which are formed, uses composition, hydrogen barrier film, the manufacturing method of hydrogen barrier film and electronic component 东京应化工业株式会社 2019-10-11 CN disclosed
CN-109715747-A Cured film forms composition 日产化学株式会社 2019-05-03 CN disclosed
CN-105324103-B Nail coatings with enhanced adhesion 指甲创意设计股份有限公司 2018-07-20 CN disclosed
CN-107703658-A The manufacture method of substrate 东京应化工业株式会社 2018-02-16 CN disclosed
US-9416300-B2 Low temperature curable adhesive compositions SIMPSON STRONG-TIE COMPANY, INC. (US) 2016-08-16 US disclosed
CN-105324103-A Nail coatings with enhanced adhesion CREATIVE NAIL DESIGN INC 2016-02-10 CN disclosed
US-5670083-A CROSSLINKED LIQUID CRYSTAL POLYMER FUJI XEROX CO., LTD. (JP) 1997-09-23 US disclosed
US-5663211-A Ultraviolet curing resin having low primary irritation index for optical disk SONY CHEMICALS CORPORATION (JP) 1997-09-02 US disclosed
EP-0430209-B1 Resin composition for cast polymerization MITSUBISHI RAYON CO (JP) 1996-02-28 EP disclosed
EP-0669548-A1 Optical element and process for producing the same FUJI XEROX CO., LTD. (JP) 1995-08-30 EP disclosed
US-5247038-A Optical materials MITSUBISHI RAYON CO., LTD. (JP) 1993-09-21 US disclosed
EP-0430209-A2 Resin composition for cast polymerization MITSUBISHI RAYON CO., LTD. (JP) 1991-06-05 EP disclosed
JP-S61144601-A PRODUCTION OF PLASTIC LENS MITSUBISHI RAYON CO LTD 1986-07-02 JP disclosed
JP-S61127713-A PRODUCTION OF PLASTIC LENS MATERIAL HAVING HIGH REFRACTIVE INDEX MITSUBISHI RAYON CO LTD 1986-06-16 JP disclosed
EP-0049559-A2 Dental restorative compositions SYBRON CORPORATION (US) 1982-04-14 EP disclosed