Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 2/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 2/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.32 |
| ▸ | APEX1 | P27695 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Adamantane SCHEMBL131439 | 0.84 | TDP1 (0.38) | HSD11B1MAPTTDP1CYP2C9EPHX2 | |
| Adamantane SCHEMBL21924976 | 0.84 | TDP1 (0.38) | HSD11B1MAPTTDP1CYP2C9EPHX2 | |
| Adamantane SCHEMBL22115918 | 0.84 | TDP1 (0.38) | HSD11B1MAPTTDP1CYP2C9EPHX2 | |
| SCHEMBL160953 | 0.84 | HSD11B1 (0.48) | HSD11B1POLBTDP1APEX1CYP2C9 | |
| SCHEMBL19859959 | 0.84 | HSD11B1 (0.48) | HSD11B1POLBTDP1APEX1CYP2C9 | |
| SCHEMBL16698251 | 0.84 | HSD11B1 (0.48) | HSD11B1POLBTDP1APEX1CYP2C9 | |
| SCHEMBL31349739 | 0.82 | HSD11B1 (0.46) | HSD11B1POLBTDP1APEX1CYP2C9 | |
| SCHEMBL28134787 | 0.82 | HSD11B1 (0.46) | HSD11B1POLBTDP1APEX1CYP2C9 | |
| Hydrochloric Acid SCHEMBL3051989 | 0.82 | HSD11B1 (0.46) | HSD11B1POLBTDP1APEX1CYP2C9 | |
| SCHEMBL27917064 | 0.82 | HSD11B1 (0.46) | HSD11B1POLBTDP1APEX1CYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20040058279-A1 | Pattern formation material, pattern formation method, and exposure mask fabrication method | KABUSHIKI KAISHA TOSHIBA | 2004-03-25 | — | — | US | disclosed |
| US-6660455-B2 | Alkali-soluble resin, photoacid generator, and dissolution inhibiting groups, increasing the sensitivity of the pattern formation material | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-12-09 | — | — | US | disclosed |
| US-20010026895-A1 | Pattern formation material, pattern formation method, and exposure mask fabrication method | KABUSHIKI KAISHA TOSHIBA | 2001-10-04 | — | — | US | disclosed |