SCHEMBL6869846

SCHEMBL6869846

CC1CC(=O)CC1(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19649528 0.75 CRBN (0.32)
SCHEMBL13966491 0.75 CRBN (0.32)
SCHEMBL7749980 0.75 CYP19A1 (0.37)
SCHEMBL19449950 0.75 CYP19A1 (0.37)
SCHEMBL10261126 0.75 CYP19A1 (0.37)
SCHEMBL19649539 0.75 CRBN (0.32)
SCHEMBL7751348 0.75 CYP11B2 (0.30)
SCHEMBL7945889 0.73 PTPN1 (0.32)
SCHEMBL27982160 0.72
SCHEMBL9745736 0.70 ALDH1A1 (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104752171-B gap filling material and method 台湾积体电路制造股份有限公司 2018-02-27 CN disclosed
CN-104051380-B Wiring system and technique 台湾积体电路制造股份有限公司 2017-08-15 CN disclosed
EP-2771740-A1 PHOTOSENSITIVE NEGATIVE RESIN COMPOSITION, FINE STRUCTURE, PRODUCTION PROCESS OF FINE STRUCTURE AND LIQUID EJECTION HEAD Canon Kabushiki Kaisha (JP) 2014-09-03 EP disclosed
EP-2766334-A1 NOVEL CYCLOALKANE ALDEHYDES, METHOD FOR PREPARING SAME, AND USE THEREOF IN THE PERFUME INDUSTRY V. Mane Fils (FR) 2014-08-20 EP disclosed
WO-2013115393-A1 PHOTOSENSITIVE NEGATIVE RESIN COMPOSITION, FINE STRUCTURE, PRODUCTION PROCESS OF FINE STRUCTURE AND LIQUID EJECTION HEAD CANON KABUSHIKI KAISHA (JP) 2013-08-08 WO disclosed
WO-2013054253-A1 NOVEL CYCLOALKANE ALDEHYDES, METHOD FOR PREPARING SAME, AND USE THEREOF IN THE PERFUME INDUSTRY V. MANE FILS (FR) 2013-04-18 WO disclosed
WO-2013047902-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2013-04-04 WO disclosed
CN-102844710-A Pattern forming method and resist composition FUJIFILM CORP 2012-12-26 CN disclosed
CN-102822746-A Pattern forming method and resist composition FUJIFILM CORP 2012-12-12 CN disclosed
CN-102812400-A Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same FUJIFILM CORP 2012-12-05 CN disclosed
EP-0362646-B1 MIXTURE OF SPECIAL POLYCARBONATES AND OTHER THERMOPLASTS OR ELASTOMERS BAYER AG (DE) 1992-05-27 EP disclosed
US-5115076-A Molding materials BAYER AKTIENGESELLSCHAFT (DE) 1992-05-19 US disclosed
US-5104723-A Dimensional stable films BAYER AKTIENGESELLSCHAFT (DE) 1992-04-14 US disclosed
US-5104945-A From a mixture of polycarbonates and silicone rubber BAYER AKTIENGESELLSCHAFT (DE) 1992-04-14 US disclosed
US-5086157-A Gas permeable films BAYER AKTIENGESELLSCHAFT (DE) 1992-02-04 US disclosed
US-5086159-A STABILIZED COPOLYCARBONATE FROM DIHYDROXY DIPHENYL CYCLOALKANE BAYER AKTIENGESELLSCHAFT (DE) 1992-02-04 US disclosed
EP-0359953-B1 DIHYDROXYDIPHENYLCYCLOALKANES, THEIR PREPARATION AND THEIR USE FOR THE PREPARATION OF HIGH MOLECULAR POLYCARBONATES BAYER AG (DE) 1992-01-22 EP disclosed
US-4982014-A Dihydroxydiphenyl cycloalkanes, their production and their use for the production of high molecular weight polycarbonates BAYER AKTIENGESELLSCHAFT (DE) 1991-01-01 US disclosed
EP-0400411-A2 Aromatic polyethersulphones BAYER AG (DE) 1990-12-05 EP disclosed
US-4964890-A GAS-PERMEABLE FILMS OF A THERMOPLASTIC POLYETHER HAVING DIHYDROXYBENZOPHENONE AND DIHYDROXYDIPHENYLCYCLOALKANE UNITS; DIMENSIONAL STABILITY; HEAT RESISTANCE; MEMBRANES BAYER AKTIENGESELLSCHAFT (DE) 1990-10-23 US disclosed