SCHEMBL688425

SCHEMBL688425

NC(=O)NCn1nnc2ccccc21

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.57
MAPT P10636 1/20 0.57
RPS6KA3 P51812 1/20 0.56
EGLN3 Q9H6Z9 1/20 0.55
RAB9A P51151 6/20 0.55
NPC1 O15118 4/20 0.55
SMN1; SMN2 Q16637 2/20 0.55
MEN1 O00255 1/20 0.55
KMT2A Q03164 1/20 0.55
HSD17B10 Q99714 1/20 0.55
GAA P10253 7/20 0.54
MGAM O43451 6/20 0.54
AMY1A P0DUB6 6/20 0.54
SI P14410 6/20 0.54
MGAM2 Q2M2H8 6/20 0.54
SLC9A1 P19634 2/20 0.51
APAF1 O14727 1/20 0.51
POLB P06746 1/20 0.51
CYP2C9 P11712 2/20 0.49
CYP2C19 P33261 2/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27414894 0.88 KDM4E (0.56) KDM4EMAPTRPS6KA3EGLN3RAB9A
SCHEMBL579871 0.87 RPS6KA3 (0.59) KDM4EMAPTRPS6KA3EGLN3RAB9A
SCHEMBL23066417 0.86 EGLN3 (0.60) KDM4EMAPTRPS6KA3EGLN3RAB9A
SCHEMBL27537607 0.84 RPS6KA3 (0.56) KDM4EMAPTRPS6KA3EGLN3RAB9A
SCHEMBL9139443 0.84 RPS6KA3 (0.56) KDM4EMAPTRPS6KA3EGLN3RAB9A
SCHEMBL438390 0.82 MGAM (0.62) KDM4EMAPTRPS6KA3EGLN3RAB9A
SCHEMBL9143600 0.81 RPS6KA3 (0.59) KDM4EMAPTRPS6KA3EGLN3RAB9A
SCHEMBL13604214 0.81 RPS6KA3 (0.52) KDM4EMAPTRPS6KA3EGLN3RAB9A
SCHEMBL27537609 0.79 KDM4E (0.55) KDM4EMAPTRPS6KA3EGLN3RAB9A
SCHEMBL2070662 0.79 GAA (0.67) KDM4EMAPTEGLN3RAB9ANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 81 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0960725-B1 Resin-coated composite foil, production and use thereof MITSUI MINING & SMELTING CO (JP) 2008-03-12 EP claimed
US-6652962-B1 Release layer containing a benzotriazole MITSUI MINING & SMELTING CO. LTD. (JP) 2003-11-25 US claimed
EP-0930811-B1 Composite copper foil, process for preparing the same, and copper-clad laminate and printed wiring board using the same MITSUI MINING & SMELTING CO (JP) 2003-08-20 EP claimed
EP-0960725-A2 Resin-coated composite foil, production and use thereof Mitsui Mining & Smelting Co., Ltd. (JP) 1999-12-01 EP claimed
CN-1118797-A Embossing inhibitor ARMSTRONG WORLD IND INC (US) 1996-03-20 CN claimed
CN-118339932-A Wiring substrate with support, method for manufacturing wiring substrate with support, and method for manufacturing electronic component mounting substrate MGC电子科技有限公司 2024-07-12 CN disclosed
CN-118234116-A Peelable metal foil, metal-clad laminate, wiring board, and semiconductor material 广州方邦电子股份有限公司 2024-06-21 CN disclosed
CN-118234118-A Peelable metal foil, metal-clad laminate, wiring board, and semiconductor material 广州方邦电子股份有限公司 2024-06-21 CN disclosed
CN-118215209-A Peelable metal foil, metal-clad laminate, wiring board, and semiconductor material 广州方邦电子股份有限公司 2024-06-18 CN disclosed
CN-113825316-B Method for producing laminate and resin layer-attached metal foil 三井金属矿业株式会社 2024-06-11 CN disclosed
US-11999131-B2 Roll-bonded laminate and method for producing the same TOYO KOHAN CO., LTD. (JP) 2024-06-04 US disclosed
CN-118043958-A Method for manufacturing package substrate for mounting semiconductor element and laminate with support substrate MGC电子科技有限公司 2024-05-14 CN disclosed
US-20040241487-A1 Electrodeposited copper foil with carrier foil MITSUI MINING & SMELTING CO., LTD. (JP) 2004-12-02 US disclosed
US-20040188263-A1 Copper foil with carrier foil, process for producing the same and copper clad laminate including the copper foil with carrier foil MITSUI MINING & SMELTING CO., LTD. (JP) 2004-09-30 US disclosed
CN-1533450-A Method for producing electrolytic copper foil with carrier foil for high-temperature heat resistance and electrolytic copper foil produced by the method ���������kҵ��ʽ���� 2004-09-29 CN disclosed
CN-1335897-A Electrodeposited copper foil with carrier and copper-clad laminate produced using the electrodeposited copper foil MITSUI MINING & SMELTING CO (JP) 2002-02-13 CN disclosed
CN-1335898-A Electrodeposited copper foil with carrier and method for manufacturing the same MITSUI MINING & SMELTING CO (JP) 2002-02-13 CN disclosed
CN-1328271-A Colour photographing base material of improved contrast and compatible with dry-and normal developing EASTMAN KODAK CO (US) 2001-12-26 CN disclosed
EP-0960725-A2 Resin-coated composite foil, production and use thereof Mitsui Mining & Smelting Co., Ltd. (JP) 1999-12-01 EP disclosed
CN-1118797-A Embossing inhibitor ARMSTRONG WORLD IND INC (US) 1996-03-20 CN disclosed