SCHEMBL6890319

SCHEMBL6890319

CC[Si](OC)(OC)OC(CCl)c1ccccc1

nearest known ligand 0.34

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 1/20 0.33
▸ SLC6A2 P23975 5/20 0.33
▸ SLC6A4 P31645 4/20 0.33
▸ KMT2A Q03164 2/20 0.33
▸ TSHR P16473 2/20 0.33
▸ MEN1 O00255 1/20 0.33
▸ CYP1A2 P05177 1/20 0.33
▸ CYP3A4 P08684 1/20 0.33
▸ CYP2D6 P10635 1/20 0.33
▸ CYP2C19 P33261 1/20 0.33
▸ SLC6A3 Q01959 1/20 0.33
▸ HTT P42858 1/20 0.33
▸ PMP22 Q01453 1/20 0.32
▸ CHRNB2 P17787 1/20 0.31
▸ CHRNA4 P43681 1/20 0.31
▸ SMN1; SMN2 Q16637 1/20 0.31
▸ TRPA1 O75762 1/20 0.30
▸ POLB P06746 1/20 0.30
▸ GSR P00390 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30539308 0.85 SLC6A2 (0.33) LMNASLC6A2SLC6A4KMT2ATSHR
SCHEMBL29111579 0.77 LMNA (0.34) LMNASLC6A2SLC6A4KMT2AMEN1
SCHEMBL28319153 0.77 DPP4 (0.35) LMNATSHRCYP1A2CYP3A4CYP2D6
SCHEMBL27601773 0.77 LMNA (0.42) LMNAKMT2ATSHRHTTTRPA1
SCHEMBL28769672 0.76 GRIN1 (0.36) SLC6A2SLC6A4KMT2ATSHRMEN1
SCHEMBL14584327 0.75 SLC6A4 (0.39) LMNASLC6A2SLC6A4KMT2ATSHR
SCHEMBL2022136 0.74 LMNA (0.33) LMNAKMT2APOLB
SCHEMBL28429369 0.73 THRB (0.39) LMNAKMT2ATSHRCYP1A2CYP3A4
SCHEMBL27844000 0.73 KDM4E (0.33) LMNAKMT2AMEN1CYP3A4CYP2C19
SCHEMBL485620 0.71 SMN1; SMN2 (0.33) LMNASLC6A2SLC6A4KMT2ATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3733719-B1 A SUBSTRATE FOR FORMATION OF A POLYMER BRUSH, A PROCESS OF PRODUCING THE SUBSTRATE, AND A PRECURSOR SOLUTION FOR USE IN THE PROCESS AIST (JP) 2023-05-24 — — EP disclosed
CN-111542550-B Base for forming polymer brush, method for producing the base, and precursor liquid used in the method 国立研究开发法人产业技术综合研究所 2022-07-19 — — CN disclosed
EP-3733719-A1 SUBSTRATE FOR POLYMER BRUSH FORMATION, PRODUCTION METHOD FOR SUBSTRATE FOR POLYMER BRUSH FORMATION, AND PRECURSOR LIQUID FOR USE IN PRODUCTION METHOD FOR SUBSTRATE FOR POLYMER BRUSH FORMATION NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2020-11-04 — — EP disclosed
CN-111542550-A Base for forming polymer brush, method for producing the base, and precursor liquid used in the method 国立研究开发法人产业技术综合研究所 2020-08-14 — — CN disclosed
CN-104471387-B Fixing phase 株式会社大赛璐 2016-08-24 — — CN disclosed
CN-104471387-A Stationary phase DAICEL CORP 2015-03-25 — — CN disclosed
EP-2647013-A1 METHOD FOR PREPARING PROTON CONDUCTING INORGANIC PARTICLES Commissariat à l'Énergie Atomique et aux Énergies Alternatives (FR) 2013-10-09 — — EP disclosed
CN-101802082-B Spin-on protective coatings for wet-etch processing of microelectronic substrates BREWER SCIENCE INC 2013-03-20 — — CN disclosed
WO-2012072572-A1 METHOD FOR PREPARING PROTON CONDUCTING INORGANIC PARTICLES Commissariat à l'énergie atomique et aux énergies alternatives (FR) 2012-06-07 — — WO disclosed
CN-101802082-A The spinning supercoat that is used for the microelectronic substrates wet etch process BREWER SCIENCE INC 2010-08-11 — — CN disclosed
US-20040214381-A1 Process for the production of organic transistor and organic transistor PIONEER CORPORATION 2004-10-28 — — US disclosed
EP-1471586-A1 Process for the production of organic transistor and organic transistor Pioneer Corporation (JP) 2004-10-27 — — EP disclosed
CN-1540776-A Method of mfg. organic transistor and organic transistor �ձ������ȷ湫˾ 2004-10-27 — — CN disclosed
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