Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Nitric Oxide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Nitric Oxide SCHEMBL29482770 | 0.89 | — | — | |
| Nitric Oxide SCHEMBL7560 | 0.87 | — | — | |
| Nitric Oxide SCHEMBL3993955 | 0.87 | — | — | |
| Nitric Oxide SCHEMBL306589 | 0.75 | — | — | |
| Nitric Oxide SCHEMBL2731176 | 0.75 | — | — | |
| Nitric Oxide SCHEMBL2888647 | 0.75 | — | — | |
| Nitric Oxide SCHEMBL7184108 | 0.75 | — | — | |
| Nitric Oxide SCHEMBL3636459 | 0.75 | — | — | |
| Nitric Oxide SCHEMBL37670 | 0.75 | — | — | |
| Nitric Oxide SCHEMBL5104249 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112666789-B | Attenuation type high-uniformity phase shift photomask blank and preparation method thereof | 湖南普照信息材料有限公司 | 2024-05-24 | — | — | CN | claimed |
| CN-113608405-A | High-precision submicron wafer packaging level photomask substrate and production method thereof | 东莞市宏诚光学制品有限公司 | 2021-11-05 | — | — | CN | claimed |
| CN-113589639-A | High-precision double-sided blue light mask base plate and manufacturing method thereof | 东莞市宏诚光学制品有限公司 | 2021-11-02 | — | — | CN | claimed |
| CN-112666789-A | Attenuation type high-uniformity phase shift photomask blank and preparation method thereof | 湖南普照信息材料有限公司 | 2021-04-16 | — | — | CN | claimed |
| CN-104201082-A | METHOD FOR OPERATING A PULSED ARC SOURCE | OERLIKON TRADING AG | 2014-12-10 | — | — | CN | claimed |
| CN-101263575-A | Method for operating a pulsed arc source | UNAXIS BALZERS AG (CH) | 2008-09-10 | — | — | CN | claimed |
| US-20040066606-A1 | Electricity accumulating element | NIPPON PAINT CO., LTD. | 2004-04-08 | — | — | US | claimed |
| JP-6138650-A | — | — | None | — | — | JP | disclosed |
| CN-222167257-U | Double-sided spin-coating chromium plate | 东莞市宏诚光学制品有限公司 | 2024-12-13 | — | — | CN | disclosed |
| CN-113608405-A | High-precision submicron wafer packaging level photomask substrate and production method thereof | 东莞市宏诚光学制品有限公司 | 2021-11-05 | — | — | CN | disclosed |
| CN-113589639-A | High-precision double-sided blue light mask base plate and manufacturing method thereof | 东莞市宏诚光学制品有限公司 | 2021-11-02 | — | — | CN | disclosed |
| CN-112666789-A | Attenuation type high-uniformity phase shift photomask blank and preparation method thereof | 湖南普照信息材料有限公司 | 2021-04-16 | — | — | CN | disclosed |
| US-10831057-B2 | Color filter substrate, display panel and manufacturing method thereof, and display device | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2020-11-10 | — | — | US | disclosed |
| CN-102782422-B | Optically active multilayer system for solar absorption | ALMECO TINOX GMBH | 2014-09-17 | — | — | CN | disclosed |
| CN-103616795-A | Strong acid resistant photomask and production method thereof | OMNISUN INFORMATION MATERIALS CO LTD | 2014-03-05 | — | — | CN | disclosed |
| CN-102782422-A | Optically active multilayer system for solar absorption | ALMECO TINOX GMBH | 2012-11-14 | — | — | CN | disclosed |
| CN-101424873-A | Photo mask using soda-lime glass as substrate and method for manufacturing same | HUNAN OMNISUN INFORMATION MATE (CN) | 2009-05-06 | — | — | CN | disclosed |
| CN-101263575-A | Method for operating a pulsed arc source | UNAXIS BALZERS AG (CH) | 2008-09-10 | — | — | CN | disclosed |
| US-20040066606-A1 | Electricity accumulating element | NIPPON PAINT CO., LTD. | 2004-04-08 | — | — | US | disclosed |
| JP-H06138650-A | PHOTOMASK BLANK AND PRODUCTION OF PHOTOMASK | TOPPAN PRINTING CO LTD | 1994-05-20 | — | — | JP | disclosed |