⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL2849406 | 0.91 | — | — | |
| SCHEMBL6892 | 0.89 | — | — | |
| SCHEMBL20455819 | 0.89 | — | — | |
| SCHEMBL7573200 | 0.89 | — | — | |
| Methane SCHEMBL28190917 | 0.80 | — | — | |
| SCHEMBL9741299 | 0.80 | — | — | |
| SCHEMBL2407786 | 0.80 | — | — | |
| SCHEMBL3912341 | 0.80 | — | — | |
| Fluoride SCHEMBL27656953 | 0.80 | — | — | |
| SCHEMBL27719336 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 293 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117946152-A | Comprehensive utilization method of tetrafluoropropanol byproducts | 中昊晨光化工研究院有限公司 | 2024-04-30 | — | — | CN | claimed |
| CN-111206279-B | System and method for preparing electronic grade polysilicon for low internal stress zone melting | 江苏鑫华半导体科技股份有限公司 | 2023-09-22 | — | — | CN | claimed |
| CN-116514125-A | Method for monitoring and adjusting growth of trichlorosilane hydrogen reduction polysilicon | 苏州鑫晶人工智能技术研发有限公司 | 2023-08-01 | — | — | CN | claimed |
| CN-114029086-B | Axial chiral naphthalene-pyrrole phosphine catalyst and preparation method and application thereof | 江苏师范大学 | 2022-05-27 | — | — | CN | claimed |
| CN-114029086-A | Axial chiral naphthalene-pyrrole phosphine catalyst and preparation method and application thereof | 江苏师范大学 | 2022-02-11 | — | — | CN | claimed |
| CN-212175076-U | System for preparing electronic grade polycrystalline silicon for low internal stress zone melting | 江苏鑫华半导体材料科技有限公司 | 2020-12-18 | — | — | CN | claimed |
| CN-111704140-A | Heat energy recovery process for chlorohydrination fluidized bed | 新疆协鑫新能源材料科技有限公司 | 2020-09-25 | — | — | CN | claimed |
| CN-111206279-A | System and method for preparing electronic grade polycrystalline silicon for low internal stress zone melting | 江苏鑫华半导体材料科技有限公司 | 2020-05-29 | — | — | CN | claimed |
| US-10480071-B2 | Continuous distillation trichlorosilane vaporization supply apparatus | TECHNO BOUNDARY CO. (JP) | 2019-11-19 | — | — | US | claimed |
| CN-106910673-B | A kind of epitaxy method reducing SiC epitaxial wafer surface triangles defect | 东莞市天域半导体科技有限公司 | 2019-05-21 | — | — | CN | claimed |
| CN-102532183-A | Carbazole chlorosilane and preparation method thereof | UNIV JINAN | 2012-07-04 | — | — | CN | claimed |
| CN-102351195-A | Process for closed circulation production of polysilicon | INST PROCESS ENG CAS | 2012-02-15 | — | — | CN | claimed |
| US-20100089451-A1 | Curable Liquid Composition, Method Of Coating, Inorganic Substrate, and Semiconductor Device | DOW CORNING TORAY COMPANY, LTD. (JP) | 2010-04-15 | — | — | US | claimed |
| CN-101600755-A | Curable liquid composition, coating method, inorganic substrate and semiconductor device | DOW CORNING TORAY CO LTD (JP) | 2009-12-09 | — | — | CN | claimed |
| EP-2118175-A2 | CURABLE LIQUID COMPOSITION, METHOD OF COATING, INORGANIC SUBSTRATE, AND SEMICONDUCTOR DEVICE | Dow Corning Toray Co., Ltd. (JP) | 2009-11-18 | — | — | EP | claimed |
| CN-101528600-A | Pyrogenic silica produced in a production facility with high capacity | WACKER CHEMIE AG (DE) | 2009-09-09 | — | — | CN | claimed |
| WO-2008099767-A2 | CURABLE LIQUID COMPOSITION, METHOD OF COATING, INORGANIC SUBSTRATE, AND SEMICONDUCTOR DEVICE | DOW CORNING TORAY CO., LTD. (JP) | 2008-08-21 | — | — | WO | claimed |
| CN-101238165-A | Cyclic dihydrogenpolysiloxanes, hydrogenpolysiloxanes, processes for their production, silica type glass moldings and process for their production, optical elements and process for their production | DOW CORNING TORAY CO LTD (JP) | 2008-08-06 | — | — | CN | claimed |
| US-4179530-A | Process for the deposition of pure semiconductor material | WACKER-CHEMITRONIC GESELLSCHAFT FUR ELEKTRONIK-GRUNDSTOFFE MBH (DE) | 1979-12-18 | — | — | US | claimed |
| US-4065533-A | Process for the continuous production of silicon rods or tubes by gaseous deposition into a flexible wound band | WACKER-CHEMITRONIC GESELLSCHAFT FUR ELEKTRONIK GRUNDSTOFFE MBH (DT) | 1977-12-27 | — | — | US | claimed |