Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MMP2 | P08253 | 1/20 | 0.37 |
| ▸ | CA2 | P00918 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 2/20 | 0.32 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.31 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.31 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19326634 | 0.94 | MMP2 (0.36) | MMP2CA2TSHRALOX15PDK2 | |
| SCHEMBL9617287 | 0.82 | CD44 (0.38) | TSHRALOX15PDK2SMN1; SMN2ALDH1A1 | |
| SCHEMBL30390082 | 0.80 | MMP2 (0.39) | MMP2CA2TSHRALOX15PDK2 | |
| SCHEMBL6757407 | 0.80 | MMP2 (0.39) | MMP2CA2TSHRALOX15PDK2 | |
| SCHEMBL6756206 | 0.79 | MMP2 (0.42) | MMP2CA2TSHRALOX15PDK2 | |
| SCHEMBL103733 | 0.79 | MMP2 (0.42) | MMP2CA2TSHRALOX15GABRA1 | |
| SCHEMBL1964819 | 0.79 | SMN1; SMN2 (0.39) | CA2TSHRALOX15PDK2SMN1; SMN2 | |
| SCHEMBL6004099 | 0.78 | SMN1; SMN2 (0.38) | TSHRALOX15PDK2SMN1; SMN2ALDH1A1 | |
| SCHEMBL9016041 | 0.77 | CYP3A4 (0.48) | TSHRSMN1; SMN2ALDH1A1CYP3A4HPGD | |
| SCHEMBL6319546 | 0.77 | TSHR (0.31) | TSHRSMN1; SMN2ALDH1A1CYP3A4HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3290461-B1 | POLYIMIDE RESIN AND FILM USING SAME | KOLON INC (KR) | 2024-01-17 | — | — | EP | claimed |
| CN-107531902-B | Polyimide resin and film using the same | 可隆工业株式会社 | 2020-10-02 | — | — | CN | claimed |
| US-RE48141-E1 | Transparent polyamide-imide resin and film using same | KOLON INDUSTRIES, INC. (KR) | 2020-08-04 | — | — | US | claimed |
| CN-107001629-B | Resin and photosensitive polymer combination | 东丽株式会社 | 2019-09-24 | — | — | CN | claimed |
| EP-3088440-B1 | TRANSPARENT POLYAMIDE-IMIDE RESIN AND FILM USING SAME | KOLON INC (KR) | 2018-09-19 | — | — | EP | claimed |
| US-20180134848-A1 | POLYIMIDE RESIN AND FILM USING SAME | KOLON INDUSTRIES, INC. (KR) | 2018-05-17 | — | — | US | claimed |
| EP-3290461-A1 | POLYIMIDE RESIN AND FILM USING SAME | Kolon Industries, Inc. (KR) | 2018-03-07 | — | — | EP | claimed |
| EP-2555053-B1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES (JP) | 2017-10-18 | — | — | EP | claimed |
| US-9758623-B2 | Polyimide precursor and polyimide | UBE INDUSTRIES, LTD. (JP) | 2017-09-12 | — | — | US | claimed |
| US-9580555-B2 | Transparent polyamide-imide resin and film using same | KOLON INDUSTRIES, INC. (KR) | 2017-02-28 | — | — | US | claimed |
| US-20160319076-A1 | TRANSPARENT POLYAMIDE-IMIDE RESIN AND FILM USING SAME | KOLON INDUSTRIES, INC. (KR) | 2016-11-03 | — | — | US | claimed |
| EP-3088440-A1 | TRANSPARENT POLYAMIDE-IMIDE RESIN AND FILM USING SAME | Kolon Industries, Inc. (KR) | 2016-11-02 | — | — | EP | claimed |
| US-20160032056-A1 | POLYIMIDE PRECURSOR AND POLYIMIDE | UBE CORPORATION (JP) | 2016-02-04 | — | — | US | claimed |
| WO-2024247983-A1 | COMPOSITION | 東レ株式会社 | 2024-12-05 | — | — | WO | disclosed |
| CN-117567742-B | Preparation method of yellowing-resistant transparent polyimide substrate material | 株洲时代新材料科技股份有限公司 | 2024-03-29 | — | — | CN | disclosed |
| CN-117567742-A | Preparation method of yellowing-resistant transparent polyimide substrate material | 株洲时代新材料科技股份有限公司 | 2024-02-20 | — | — | CN | disclosed |
| US-6524764-B1 | Alkali-developable; polyamide, phenol compound and/or ester of a naphthoquinone diazide sulphonic acid | TORAY INDUSTRIES, INC. (JP) | 2003-02-25 | — | — | US | disclosed |
| US-20020162998-A1 | Display | TORAY INDUSTRIES, INC. (JP) | 2002-11-07 | — | — | US | disclosed |
| EP-1132773-A1 | POSITIVE-TYPE PHOTOSENSITIVE POLYIMIDE PRECURSOR COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2001-09-12 | — | — | EP | disclosed |
| EP-1037112-A1 | POSITIVE PHOTOSENSITIVE RESIN PRECURSOR COMPOSITION AND PROCESS FOR PRODUCING THE SAME | TORAY INDUSTRIES, INC. (JP) | 2000-09-20 | — | — | EP | disclosed |