SCHEMBL6757407

SCHEMBL6757407

Nc1cccc(C(c2cccc(N)c2O)(C(F)(F)F)C(F)(F)F)c1O

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP2 P08253 1/20 0.39
CA2 P00918 1/20 0.37
ESR1 P03372 1/20 0.35
ESR2 Q92731 1/20 0.35
TSHR P16473 3/20 0.34
ALOX15 P16050 2/20 0.34
PDK2 Q15119 1/20 0.33
GABRA1 P14867 1/20 0.32
GABRB2 P47870 1/20 0.32
CYP3A4 P08684 3/20 0.32
ALDH1A1 P00352 2/20 0.32
HPGD P15428 2/20 0.32
HSD17B10 Q99714 2/20 0.32
TDP1 Q9NUW8 1/20 0.32
SMN1; SMN2 Q16637 3/20 0.32
PIK3CA P42336 1/20 0.31
KDM4E B2RXH2 2/20 0.31
MEN1 O00255 2/20 0.31
MAPT P10636 2/20 0.31
KMT2A Q03164 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30390082 1.00 MMP2 (0.39) MMP2CA2ESR1ESR2TSHR
SCHEMBL103733 0.83 MMP2 (0.42) MMP2CA2TSHRALOX15GABRA1
SCHEMBL6756206 0.83 MMP2 (0.42) MMP2CA2TSHRALOX15PDK2
SCHEMBL689226 0.80 MMP2 (0.37) MMP2CA2TSHRALOX15PDK2
SCHEMBL19326634 0.79 MMP2 (0.36) MMP2CA2TSHRALOX15PDK2
SCHEMBL19837804 0.79 MMP2 (0.36) MMP2CA2TSHRALOX15PDK2
SCHEMBL9837909 0.78 GAA (0.35) CYP3A4ALDH1A1HPGDMAPTNPSR1
SCHEMBL8655007 0.78 CD44 (0.39) TSHRALOX15PDK2CYP3A4ALDH1A1
SCHEMBL29380196 0.78 SMN1; SMN2 (0.43) CA2TSHRALOX15PDK2CYP3A4
SCHEMBL2800809 0.78 SMN1; SMN2 (0.43) CA2TSHRALOX15PDK2CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230183467-A1 Polymer and Elastomer Compositions Having Carbon Nanostructure Additives and Articles Formed Therefrom for Use in EMI and RFI Shielding and in Pressure Sensing Seals Having Quantum Tunneling Composite Effects GREENE, TWEED TECHNOLOGIES, INC. 2023-06-15 US disclosed
US-10669377-B2 Polyimide solution, heat-resistant non-woven fabric, and method for manufacturing same TORAY INDUSTRIES, INC. (JP) 2020-06-02 US disclosed
US-20170342214-A1 POLYIMIDE SOLUTION, HEAT-RESISTANT NON-WOVEN FABRIC, AND METHOD FOR MANUFACTURING SAME TORAY INDUSTRIES, INC. (JP) 2017-11-30 US disclosed
EP-3216819-A1 POLYIMIDE SOLUTION, HEAT-RESISTANT NON-WOVEN FABRIC, AND METHOD FOR MANUFACTURING SAME Toray Industries, Inc. (JP) 2017-09-13 EP disclosed
US-20040152862-A1 Optical resins and applications thereof HITACHI CHEMICAL CO., LTD. (JP) 2004-08-05 US disclosed
EP-0725284-B1 Ocular lens material MENICON CO LTD (JP) 2002-05-22 EP disclosed
EP-0634673-B1 Ocular lens material MENICON CO LTD (JP) 1999-10-20 EP disclosed
US-5703143-A SILICON-CONTAINING POLYPHENYLENE ETHER POLYMER MENICON CO., LTD. (JP) 1997-12-30 US disclosed
US-5605942-A POLYIMIDE HAVING EXCELLENT TRANSPARENCY, OXYGEN PERMEABILITY, HEAT RESISTANCE, ULTRAVIOLET LIGHT ABSORPTION MENICON CO., LTD. (JP) 1997-02-25 US disclosed
EP-0725284-A2 Ocular lens material Menicon Co., Ltd. (JP) 1996-08-07 EP disclosed
US-5543442-A POLYIMIDESILOXANE COPOLYMER MENICON CO., LTD. (JP) 1996-08-06 US disclosed
EP-0634673-A1 Ocular lens material Menicon Co., Ltd. (JP) 1995-01-18 EP disclosed
EP-0264678-B1 POLYAMIDES WITH HEXAFLUOROISOPROPYLIDENE GROUPS, POSITIVELY ACTING PHOTOSENSITIVE COMPOSITIONS, AND RECORDING MATERIALS USING THEM HOECHST CELANESE CORPORATION (US) 1991-09-18 EP disclosed
EP-0264678-A1 Polyamides with hexafluoroisopropylidene groups, positively acting photosensitive compositions, and recording materials using them HOECHST CELANESE CORPORATION (US) 1988-04-27 EP disclosed