Benzoic Acid

Benzoic Acid

SCHEMBL689795

CCN(C)C.O=C(O)c1ccccc1

nearest known ligand 0.64

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

CACNA1CCACNA1DCACNA1FCACNA1SDPP4HTR1BHTR1D

The experimentally established mechanism targets of Benzoic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.64
DAO P14920 1/20 0.64
NAPRT Q6XQN6 1/20 0.64
CES2 O00748 2/20 0.54
CES1 P23141 2/20 0.54
SRD5A2 P31213 1/20 0.54
ALDH1A1 P00352 5/20 0.50
EGFR P00533 2/20 0.50
HPGD P15428 2/20 0.50
PGR P06401 1/20 0.50
ADRA2A P08913 1/20 0.50
ADRA2B P18089 1/20 0.50
HTR2A P28223 1/20 0.50
HRH1 P35367 1/20 0.50
KCNH2 Q12809 1/20 0.50
KMT2A Q03164 1/20 0.48
HIF1A Q16665 1/20 0.48
TP53 P04637 1/20 0.48
MAPT P10636 2/20 0.47
NPC1 O15118 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzoic Acid SCHEMBL28676134 0.89 TSHR (0.61) TSHRDAONAPRTCES2CES1
Benzophenone SCHEMBL27611611 0.86 ALDH1A1 (0.66) SRD5A2ALDH1A1EGFRHPGDPGR
Benzoic Acid SCHEMBL1463186 0.86 TSHR (0.64) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL2400344 0.85 TSHR (0.78) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL9705228 0.85 TSHR (0.78) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL28601772 0.85 TSHR (0.78) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL28693411 0.85 TSHR (0.78) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL1110868 0.85 TSHR (0.78) TSHRDAONAPRTCES2CES1
N,N-Dimethylethanaminium SCHEMBL27712526 0.84 ALDH1A1 (0.48) TSHRCES2CES1ALDH1A1EGFR
Benzoic Acid SCHEMBL7547475 0.84 TSHR (0.61) TSHRDAONAPRTCES2CES1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116874915-A Silane self-crosslinking low-smoke halogen-free polyolefin cable material and preparation method thereof 廊坊崔氏电缆材料股份有限公司 2023-10-13 CN claimed
CN-114672322-A PDLC light modulation material, light modulation film and preparation method of light modulation film 深圳市高仁电子新材料有限公司 2022-06-28 CN claimed
CN-113652181-A Novel UV (ultraviolet) viscosity-reducing adhesive and preparation method thereof 深圳市高仁电子新材料有限公司 2021-11-16 CN claimed
CN-113604171-A Black optical cement and preparation method thereof 深圳市高仁电子新材料有限公司 2021-11-05 CN claimed
CN-113249039-A Optical adhesive 广西向东电子科技有限公司 2021-08-13 CN claimed
CN-111944455-A High-weather-resistance blue-light-proof optical adhesive and film forming preparation method thereof 深圳市高仁电子新材料有限公司 2020-11-17 CN claimed
JP-4037112-A None JP disclosed
US-20240009357-A1 3D PRINTING OF BIOMEDICAL IMPLANTS NORTHWESTERN UNIVERSITY 2024-01-11 US disclosed
CN-116874915-A Silane self-crosslinking low-smoke halogen-free polyolefin cable material and preparation method thereof 廊坊崔氏电缆材料股份有限公司 2023-10-13 CN disclosed
CN-116855954-A Method for cleaning developing tank or film stripping tank 立讯精密工业(滁州)有限公司 2023-10-10 CN disclosed
CN-116560132-A Preparation method of high-transmittance low-haze dimming film 佛山辰威新材料科技有限公司 2023-08-08 CN disclosed
EP-3959247-B1 LOW VISCOSITY CROSSLINKABLE COMPOSITIONS FOR COATINGS AND MATERIALS WITH A HIGH REFRACTIVE INDEX AND HIGH THERMAL DEFLECTION TEMPERATURE ARKEMA FRANCE (FR) 2023-04-19 EP disclosed
CN-115974846-A Synthetic method and application of organic dye fluorescent small molecule material 深圳职业技术学院 2023-04-18 CN disclosed
EP-0798590-A2 Liquid crystal display element with a transparent electrode substrate, and the transparent electrode substrate TEIJIN LIMITED (JP) 1997-10-01 EP disclosed
EP-0432907-B1 Improved paste compositions JOHNSON MATTHEY PLC (GB) 1995-05-17 EP disclosed
US-5173457-A Low-temperature firing of a thick film comprising a binder and dielectric glass particles prepared by a gel-sol method; printed circuits; photoresists JOHNSON MATTHEY PUBLIC LIMITED COMPANY (GB) 1992-12-22 US disclosed
JP-H0437112-A ELECTROLYTE FOR ELECTROLYTIC CAPACITOR ELNA CO LTD 1992-02-07 JP disclosed
EP-0432907-A1 Improved paste compositions JOHNSON MATTHEY PUBLIC LIMITED COMPANY (GB) 1991-06-19 EP disclosed
US-4925773-A PHOTOCURABLE RESIN KABUSHIKI KAISHA TOSHIBA (JP) 1990-05-15 US disclosed
EP-0273729-A2 Solder resist ink composition KABUSHIKI KAISHA TOSHIBA (JP) 1988-07-06 EP disclosed