⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL437296 | 0.82 | TP53 (0.44) | — | |
| SCHEMBL29434674 | 0.82 | TP53 (0.44) | — | |
| SCHEMBL431999 | 0.80 | ALDH1A1 (0.44) | — | |
| SCHEMBL315824 | 0.78 | — | — | |
| SCHEMBL30018341 | 0.76 | ALDH1A1 (0.39) | — | |
| SCHEMBL6909166 | 0.73 | — | — | |
| SCHEMBL31494219 | 0.71 | — | — | |
| SCHEMBL31494214 | 0.71 | — | — | |
| SCHEMBL29160575 | 0.71 | TP53 (0.48) | — | |
| SCHEMBL13027895 | 0.70 | NOS3 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6709715-B1 | DEPOSITING DIELECTRIC LAYER; USING SUCH AS TETRAVINYL-TETRAMETHYLCYCLOTETRASILOXANE, TETRAALLYLOXYSILANE OR TRIVINYLMETHYLSILANE | APPLIED MATERIALS INC. | 2004-03-23 | — | — | US | disclosed |
| US-6362115-B1 | DISSOCIATING 1,4-BIS(FORMATOMETHYL)BENZENE OR 1,4-BIS(N-METHYLAMINOMETHYL) BENZENE, CONDENSING P-XYLYLENE TO FORM A POLYMERIZED THIN POLYMER OR COPOLYMER LAYER; LOW DIELECTRIC CONSTANTS; SEMICONDUCTORS | APPLIED MATERIALS, INC. | 2002-03-26 | — | — | US | disclosed |
| EP-1098718-A1 | CHEMICAL VAPOR DEPOSITION OF A COPOLYMER OF P-XYLYLENE AND A MULTIVINYL SILICON/OXYGEN COMONOMER | Applied Materials, Inc. (US) | 2001-05-16 | — | — | EP | disclosed |
| US-6086952-A | Chemical vapor deposition of a copolymer of p-xylylene and a multivinyl silicon/oxygen comonomer | APPLIED MATERIALS, INC. (US) | 2000-07-11 | — | — | US | disclosed |
| WO-1999065617-A1 | CHEMICAL VAPOR DEPOSITION OF A COPOLYMER OF P-XYLYLENE AND A MULTIVINYL SILICON/OXYGEN COMONOMER | APPLIED MATERIALS, INC. (US) | 1999-12-23 | — | — | WO | disclosed |