⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18282347 | 0.85 | TSHR (0.33) | — | |
| SCHEMBL2462839 | 0.85 | ALDH1A1 (0.32) | — | |
| SCHEMBL526487 | 0.82 | — | — | |
| SCHEMBL3807307 | 0.82 | ALDH1A1 (0.42) | — | |
| SCHEMBL7795606 | 0.82 | ALDH1A1 (0.42) | — | |
| SCHEMBL15822662 | 0.82 | EPHX1 (0.44) | — | |
| SCHEMBL4170931 | 0.79 | — | — | |
| SCHEMBL9816 | 0.79 | — | — | |
| SCHEMBL45855 | 0.79 | — | — | |
| SCHEMBL14128804 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-9031315-A | — | — | None | — | — | JP | disclosed |
| JP-9031319-A | — | — | None | — | — | JP | disclosed |
| JP-10007896-A | — | — | None | — | — | JP | disclosed |
| JP-8311321-A | — | — | None | — | — | JP | disclosed |
| US-6727294-B2 | RADIATION TRANSPARENT MOLDING MATERIALS | MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) | 2004-04-27 | — | — | US | disclosed |
| EP-0753540-B1 | Polycarbonate resin composition | MITSUBISHI ENG PLASTICS CORP (JP) | 2003-06-11 | — | — | EP | disclosed |
| US-6359028-B1 | USED IN MEDICAL EQUIPMENT, DISCOLORATION INHIBITION | MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) | 2002-03-19 | — | — | US | disclosed |
| US-6040367-A | EXCELLENT RESISTANCE TO AN IONIZING RADIATION, IN WHICH HETEROCYCLIC COMPOUND CONTAINING OXYMETHYLENE UNITS | MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) | 2000-03-21 | — | — | US | disclosed |
| US-5977206-A | Polycarbonate resin composition | MITSUBISHI ENGINEERING-PLASTICS CORP. (JP) | 1999-11-02 | — | — | US | disclosed |
| US-5948838-A | 0.01 TO 5 PARTS BY WEIGHT OF A COMPOUND CONTAINING OXYMETHYLENE UNIT | MITSUBISHI ENGINEERING-PLASTICS CORP. (JP) | 1999-09-07 | — | — | US | disclosed |
| JP-H107896-A | POLYCARBONATE RESIN | MITSUBISHI ENG PLAST KK | 1998-01-13 | — | — | JP | disclosed |
| JP-H0931319-A | POLYCARBONATE RESIN COMPOSITION | MITSUBISHI ENG PLAST KK | 1997-02-04 | — | — | JP | disclosed |
| JP-H0931315-A | POLYCARBONATE RESIN COMPOSITION | MITSUBISHI ENG PLAST KK | 1997-02-04 | — | — | JP | disclosed |
| EP-0753540-A2 | Polycarbonate resin composition | MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) | 1997-01-15 | — | — | EP | disclosed |
| JP-H08311321-A | POLYCARBONATE RESIN COMPOSITION | MITSUBISHI ENG PLAST KK | 1996-11-26 | — | — | JP | disclosed |
| US-5106722-A | Photoiniators having cyclopentadieneyl or indenyl groups and fluorinated aryl or heterocyclic ring; photoresists of unsaturated compounds | CIBA-GEIGY CORPORATION (US) | 1992-04-21 | — | — | US | disclosed |
| US-5008302-A | Photoinitiators for radiation-induced polymerization of ethylenically unsaturated compounds | CIBA-GEIGY CORPORATION (US) | 1991-04-16 | — | — | US | disclosed |