Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1832545 | 1.00 | ALDH1A1 (0.39) | ALDH1A1CYP19A1TSHRSMN1; SMN2THRB | |
| SCHEMBL28137014 | 1.00 | ALDH1A1 (0.39) | ALDH1A1CYP19A1TSHRSMN1; SMN2THRB | |
| SCHEMBL74808 | 1.00 | ALDH1A1 (0.39) | ALDH1A1CYP19A1TSHRSMN1; SMN2THRB | |
| SCHEMBL685576 | 1.00 | ALDH1A1 (0.39) | ALDH1A1CYP19A1TSHRSMN1; SMN2THRB | |
| SCHEMBL685580 | 1.00 | ALDH1A1 (0.39) | ALDH1A1CYP19A1TSHRSMN1; SMN2THRB | |
| SCHEMBL47313 | 0.98 | ALDH1A1 (0.41) | ALDH1A1CYP19A1TSHRTHRB | |
| Methacrylic Acid SCHEMBL20573813 | 0.94 | CYP19A1 (0.36) | ALDH1A1CYP19A1 | |
| SCHEMBL673273 | 0.94 | ALDH1A1 (0.41) | ALDH1A1CYP19A1TSHRTHRB | |
| SCHEMBL11206600 | 0.93 | ALDH1A1 (0.54) | ALDH1A1CYP19A1TSHRSMN1; SMN2MEN1 | |
| Acrylic Acid SCHEMBL27616773 | 0.89 | CYP19A1 (0.34) | ALDH1A1CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1489459-B1 | Positive resist composition and method of forming pattern using the same | FUJIFILM CORP (JP) | 2015-10-14 | — | — | EP | disclosed |
| US-9023580-B2 | Method of forming polymeric compound, resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-05-05 | — | — | US | disclosed |
| EP-2186838-B1 | METHOD FOR PRODUCING STAR POLYMER | NIPPON SODA CO (JP) | 2014-08-27 | — | — | EP | disclosed |
| US-20130137049-A1 | METHOD OF FORMING POLYMERIC COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |
| EP-1752479-B1 | ACRYLIC STAR POLYMER | NIPPON SODA CO (JP) | 2013-02-27 | — | — | EP | disclosed |
| EP-1892255-B1 | ACRYLIC ACID POLYMER | NIPPON SODA CO (JP) | 2012-08-01 | — | — | EP | disclosed |
| US-8193286-B2 | Acrylic star polymer | NIPPON SODA CO., LTD. (JP) | 2012-06-05 | — | — | US | disclosed |
| US-8193286-B2 | Acrylic star polymer | NIPPON SODA CO., LTD. (JP) | 2012-06-05 | — | — | US | disclosed |
| US-8067515-B2 | Method of producing an acrylic acid-based polymer | NIPPON SODA CO., LTD. (JP) | 2011-11-29 | — | — | US | disclosed |
| US-8067515-B2 | Method of producing an acrylic acid-based polymer | NIPPON SODA CO., LTD. (JP) | 2011-11-29 | — | — | US | disclosed |
| US-7192681-B2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-20 | — | — | US | disclosed |
| US-7192681-B2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-20 | — | — | US | disclosed |
| US-7189492-B2 | Photosensitive composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |
| US-7189492-B2 | Photosensitive composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |
| US-7179578-B2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7179578-B2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7179579-B2 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7179579-B2 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| EP-1752479-A1 | ACRYLIC STAR POLYMER | NIPPON SODA CO., LTD. (JP) | 2007-02-14 | — | — | EP | disclosed |
| WO-2004041770-A1 | CHEMICALLY AMPLIFIED POLYMER HAVING PENDANT GROUP WITH CYCLODODECYL AND RESIST COMPOSITION COMPRISING THE SAME | DONGJIN SEMICHEM CO., LTD. (KR) | 2004-05-21 | — | — | WO | disclosed |