Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1832545 | 1.00 | ALDH1A1 (0.39) | ALDH1A1CYP19A1TSHRSMN1; SMN2THRB | |
| SCHEMBL28137014 | 1.00 | ALDH1A1 (0.39) | ALDH1A1CYP19A1TSHRSMN1; SMN2THRB | |
| SCHEMBL74808 | 1.00 | ALDH1A1 (0.39) | ALDH1A1CYP19A1TSHRSMN1; SMN2THRB | |
| SCHEMBL685576 | 1.00 | ALDH1A1 (0.39) | ALDH1A1CYP19A1TSHRSMN1; SMN2THRB | |
| SCHEMBL6912158 | 1.00 | ALDH1A1 (0.39) | ALDH1A1CYP19A1TSHRSMN1; SMN2THRB | |
| SCHEMBL47313 | 0.98 | ALDH1A1 (0.41) | ALDH1A1CYP19A1TSHRTHRB | |
| Methacrylic Acid SCHEMBL20573813 | 0.94 | CYP19A1 (0.36) | ALDH1A1CYP19A1 | |
| SCHEMBL673273 | 0.94 | ALDH1A1 (0.41) | ALDH1A1CYP19A1TSHRTHRB | |
| SCHEMBL11206600 | 0.93 | ALDH1A1 (0.54) | ALDH1A1CYP19A1TSHRSMN1; SMN2MEN1 | |
| Acrylic Acid SCHEMBL27616773 | 0.89 | CYP19A1 (0.34) | ALDH1A1CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 125 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024005049-A1 | COMPOSITION, RESIN COMPOSITION, FILM FORMATION COMPOSITION, PATTERN FORMATION METHOD, AND COMPOUND | 三菱瓦斯化学株式会社 | 2024-01-04 | — | — | WO | disclosed |
| US-20230348351-A1 | COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMATION METHOD, INSULATING FILM FORMATION METHOD, AND METHOD FOR PRODUCING COMPOUND | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-11-02 | — | — | US | disclosed |
| US-20230174688-A1 | COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING COMPOUND, AND METHOD FOR PRODUCING (CO)POLYMER | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-06-08 | — | — | US | disclosed |
| US-20220119336-A1 | COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING COMPOUND | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-04-21 | — | — | US | disclosed |
| WO-2020137935-A1 | COMPOUND, (CO)POLYMER, COMPOSITION, PATTERN FORMING METHOD, AND COMPOUND PRODUCTION METHOD | 三菱瓦斯化学株式会社 | 2020-07-02 | — | — | WO | disclosed |
| EP-2554555-B1 | METHODS FOR PRODUCING AN ADAMANTYL (METH)ACRYLATE MONOMER AND A (METH)ACRYLIC COPOLYMER THAT CONTAINS REPEATING UNITS DERIVED FROM THE MONOMER | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-09-18 | — | — | EP | disclosed |
| EP-3106477-B1 | (METH)ACRYLIC ACID ESTER COMPOUND AND PRODUCTION METHOD THEREFOR | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-08-29 | — | — | EP | disclosed |
| US-10005714-B2 | (Meth)acrylic acid ester compound and production method therefor | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-06-26 | — | — | US | disclosed |
| US-9994513-B2 | Method for producing novel ali cyclic ester compound, novel alicyclic ester compound, (meth)acrylic copolymer produced by polymerizing said compound, and photosensitive resin composition using said copolymer | MITSUBISHI GAS CHEMICAL, INC. (JP) | 2018-06-12 | — | — | US | disclosed |
| EP-2990425-B1 | NOVEL ALICYCLIC ESTER COMPOUND, AND (METH)ACRYLIC COPOLYMER AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-05-30 | — | — | EP | disclosed |
| US-7214465-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2007-05-08 | — | — | US | disclosed |
| US-7214465-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2007-05-08 | — | — | US | disclosed |
| US-7195856-B2 | Positive resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2007-03-27 | — | — | US | disclosed |
| US-7195856-B2 | Positive resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2007-03-27 | — | — | US | disclosed |
| US-7192681-B2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-20 | — | — | US | disclosed |
| US-7192681-B2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-20 | — | — | US | disclosed |
| US-7179578-B2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7179578-B2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7179579-B2 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7179579-B2 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10005714-B2 | (Meth)acrylic acid ester compound and production method therefor | AMD1, ALDH7A1, TMEM164 | ALDH1A1 118/4885CYP19A1 1347/4885TSHR 3202/4885 |
| US-20230348351-A1 | COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMATION METHOD, INSULATING FILM FORMATION METHOD, AND METHOD FOR PRODUCING COMPOUND | PHOSPHO1, RER1, RIF1 | ALDH1A1 3361/4885CYP19A1 445/4885TSHR 813/4885 |
| US-20230174688-A1 | COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING COMPOUND, AND METHOD FOR PRODUCING (CO)POLYMER | MCCC2, MMAB, INTS9 | ALDH1A1 1392/4885CYP19A1 451/4885TSHR 502/4885 |
| US-20220119336-A1 | COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING COMPOUND | PYM1, MMAB, MEN1 | ALDH1A1 1455/4885CYP19A1 830/4885TSHR 672/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.