SCHEMBL691752

SCHEMBL691752

CCCCCO[Si](CCCN)(OC)OC

nearest known ligand 0.42

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.42
DNM1 Q05193 9/20 0.39
MEN1 O00255 1/20 0.39
KMT2A Q03164 1/20 0.39
ALDH1A1 P00352 1/20 0.39
TSHR P16473 1/20 0.39
EPHX1 P07099 1/20 0.39
CA1 P00915 3/20 0.31
CA2 P00918 3/20 0.31
CA9 Q16790 3/20 0.31
HTT P42858 1/20 0.31
LPAR2 Q9HBW0 2/20 0.31
LPAR3 Q9UBY5 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4407477 0.98 LMNA (0.44) LMNADNM1MEN1KMT2AALDH1A1
SCHEMBL5816989 0.98 LMNA (0.44) LMNADNM1MEN1KMT2AALDH1A1
SCHEMBL28554977 0.98 LMNA (0.44) LMNADNM1MEN1KMT2AALDH1A1
Ammonia Solution, Strong SCHEMBL27578770 0.96 LMNA (0.43) LMNADNM1MEN1KMT2AALDH1A1
SCHEMBL31719619 0.94 DNM1 (0.43) LMNADNM1MEN1KMT2AALDH1A1
SCHEMBL3623133 0.94 LMNA (0.39) LMNADNM1MEN1KMT2AALDH1A1
SCHEMBL29623660 0.91 LMNA (0.44) LMNADNM1MEN1KMT2AALDH1A1
SCHEMBL29988559 0.91 LMNA (0.44) LMNADNM1MEN1KMT2AALDH1A1
SCHEMBL28198317 0.90 LMNA (0.39) LMNADNM1MEN1KMT2AALDH1A1
SCHEMBL8729872 0.90 NFKB1 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 271 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250354041-A1 COMPOSITION COMPRISING A SILYLATED POLYMER BOSTIK SA (FR) 2025-11-20 US claimed
CN-119859445-A Raspberry-shaped nano SiO2Super-hydrophobic perfluoropolyether compound and preparation method and application thereof 洛阳船舶材料研究所(中国船舶集团有限公司第七二五研究所) 2025-04-22 CN claimed
EP-4522691-A1 COMPOSITION COMPRISING A SILYLATED POLYMER Bostik SA (FR) 2025-03-19 EP claimed
CN-119095914-A Comprising silylation Polymer composition 波士胶公司 2024-12-06 CN claimed
WO-2023217795-A1 COMPOSITION COMPRISING A SILYLATED POLYMER BOSTIK SA (FR) 2023-11-16 WO claimed
CN-115656395-B Method for measuring multiple pesticide residues in soil by using dispersed solid phase extraction 山东省产品质量检验研究院 2023-07-18 CN claimed
CN-115656395-A Method for measuring multiple pesticide residues in soil by using dispersed solid phase extraction 山东省产品质量检验研究院 2023-01-31 CN claimed
CN-113136020-B Water-based polyurethane polymer and preparation method thereof, single-component water-based polyurethane waterproof coating and preparation method and application thereof 万华化学集团股份有限公司 2022-08-05 CN claimed
CN-113136020-A Water-based polyurethane polymer and preparation method thereof, single-component water-based polyurethane waterproof coating and preparation method and application thereof 万华化学集团股份有限公司 2021-07-20 CN claimed
EP-2828347-B1 CLEAR SILOXANE-BASED WRITE-ERASE COATING WITH LOW VOLATILE ORGANIC CHARACTER IDEAPAINT INC (US) 2020-12-02 EP claimed
EP-2804917-A1 LOW VOLATILE ORGANIC COMPOMEMT DRY ERASE SILOXANE-BASED COATINGS IdeaPaint, Inc. (US) 2014-11-26 EP claimed
WO-2013141958-A1 CLEAR SILOXANE-BASED WRITE-ERASE COATING WITH LOW VOLATILE ORGANIC CHARACTER IDEAPAINT, INC. (US) 2013-09-26 WO claimed
WO-2013110046-A1 LOW VOLATILE ORGANIC COMPOMEMT DRY ERASE SILOXANE-BASED COATINGS IDEAPAINT, INC. (US) 2013-07-25 WO claimed
CN-101983132-A High quality porous inkjet media HEWLETT PACKARD DEVELOPMENT CO 2011-03-02 CN claimed
US-20110003097-A1 HIGH QUALITY POROUS INK-JET MEDIA HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. 2011-01-06 US claimed
EP-2237966-A1 HIGH QUALITY POROUS INK-JET MEDIA Hewlett-Packard Development Company, L.P. (US) 2010-10-13 EP claimed
WO-2009096922-A1 HIGH QUALITY POROUS INK-JET MEDIA HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2009-08-06 WO claimed
US-20080268185-A1 Multi-layered porous ink-jet recording media HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. 2008-10-30 US claimed
US-6492482-B2 WEAR AND CHEMICAL RESISTANCE DEGUSS-HUELS AKTIENGESELLSCHAFT (DE) 2002-12-10 US claimed
EP-1193278-A1 Non aqueous, heat curable, two component coating composition Degussa AG (DE) 2002-04-03 EP claimed