Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.56 |
| ▸ | GAA | P10253 | 1/20 | 0.56 |
| ▸ | SSTR4 | P31391 | 1/20 | 0.53 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.51 |
| ▸ | MEN1 | O00255 | 1/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.51 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.50 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.50 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.50 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.50 |
| ▸ | METAP2 | P50579 | 1/20 | 0.49 |
| ▸ | METAP1 | P53582 | 1/20 | 0.49 |
| ▸ | PDE2A | O00408 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1330502 | 1.00 | LMNA (0.56) | LMNAGAASSTR4EPHX2MEN1 | |
| SCHEMBL28030413 | 0.85 | TSHR (0.52) | LMNACYP2C9 | |
| SCHEMBL24575927 | 0.82 | EPHX2 (0.64) | LMNAGAASSTR4EPHX2MEN1 | |
| SCHEMBL6514206 | 0.81 | LMNA (0.61) | LMNAGAASSTR4EPHX2MEN1 | |
| SCHEMBL6529748 | 0.81 | LMNA (0.61) | LMNAGAASSTR4EPHX2MEN1 | |
| SCHEMBL7263715 | 0.81 | LMNA (0.61) | LMNAGAASSTR4EPHX2MEN1 | |
| SCHEMBL29609692 | 0.81 | LMNA (0.61) | LMNAGAASSTR4EPHX2MEN1 | |
| SCHEMBL8518963 | 0.81 | LMNA (0.61) | LMNAGAASSTR4EPHX2MEN1 | |
| SCHEMBL9817975 | 0.81 | LMNA (0.61) | LMNAGAASSTR4EPHX2MEN1 | |
| SCHEMBL2934798 | 0.81 | LMNA (0.61) | LMNAGAASSTR4EPHX2MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105504154-B | A kind of hydrophobic associated polymer and preparation method thereof | 四川光亚聚合物化工有限公司 | 2019-01-04 | — | — | CN | claimed |
| EP-1964893-B2 | Ink composition, inkjet recording method, printed material, and ink set | FUJIFILM CORP (JP) | 2021-11-24 | — | — | EP | disclosed |
| EP-2105478-B1 | Inkjet recording method and inkjet recording system | FUJIFILM CORP (JP) | 2018-02-28 | — | — | EP | disclosed |
| EP-1964893-B1 | Ink composition, inkjet recording method, printed material, and ink set | FUJIFILM CORP (JP) | 2018-01-24 | — | — | EP | disclosed |
| CN-105504154-A | Hydrophobically associating polymer and preparation method thereof | SICHUAN GUANGYA POLYMER CHEMICAL CO LTD | 2016-04-20 | — | — | CN | disclosed |
| EP-2170805-B1 | METHODS OF SYNTHESIZING CINACALCET AND SALTS THEREOF | AMGEN INC (US) | 2016-03-16 | — | — | EP | disclosed |
| US-8932687-B2 | Process for producing molded printed material, and molded printed material | FUJIFILM CORPORATION (JP) | 2015-01-13 | — | — | US | disclosed |
| US-8932687-B2 | Process for producing molded printed material, and molded printed material | FUJIFILM CORPORATION (JP) | 2015-01-13 | — | — | US | disclosed |
| US-8366818-B2 | Photocurable composition | FUJIFILM CORPORATION (JP) | 2013-02-05 | — | — | US | disclosed |
| US-8366818-B2 | Photocurable composition | FUJIFILM CORPORATION (JP) | 2013-02-05 | — | — | US | disclosed |
| WO-2009002427-A2 | METHODS OF SYNTHESIZING CINACALCET AND SALTS THEREOF | AMGEN INC. (US) | 2008-12-31 | — | — | WO | disclosed |
| EP-1964893-A1 | Ink composition, inkjet recording method, printed material, and ink set | FUJIFILM Corporation (JP) | 2008-09-03 | — | — | EP | disclosed |
| US-20080206527-A1 | INK COMPOSITION, INKJET RECORDING METHOD, PRINTED MATERIAL, AND INK SET | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| US-20080206527-A1 | INK COMPOSITION, INKJET RECORDING METHOD, PRINTED MATERIAL, AND INK SET | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| US-20080075882-A1 | PROCESS FOR PRODUCING MOLDED PRINTED MATERIAL, AND MOLDED PRINTED MATERIAL | FUJIFILM CORPORATION (JP) | 2008-03-27 | — | — | US | disclosed |
| US-20080075882-A1 | PROCESS FOR PRODUCING MOLDED PRINTED MATERIAL, AND MOLDED PRINTED MATERIAL | FUJIFILM CORPORATION (JP) | 2008-03-27 | — | — | US | disclosed |
| US-20080075884-A1 | radiation curing ink cures with high sensitivity to form a high quality, durable image resistant to cracking, peeling and has excellent impact resistance, flexibility, and adhesion; a polymerizable monomer and a polymerization initiator and comprising substantially no colorant | FUJIFILM CORPORATION (JP) | 2008-03-27 | — | — | US | disclosed |
| US-20080075884-A1 | radiation curing ink cures with high sensitivity to form a high quality, durable image resistant to cracking, peeling and has excellent impact resistance, flexibility, and adhesion; a polymerizable monomer and a polymerization initiator and comprising substantially no colorant | FUJIFILM CORPORATION (JP) | 2008-03-27 | — | — | US | disclosed |
| US-5096971-A | Acrylic graft copolymer | MITSUBISHI KASEI CORPORATION (JP) | 1992-03-17 | — | — | US | disclosed |
| EP-0366042-A2 | Adsorbent for optical resolution and resolution method employing it | MITSUBISHI KASEI CORPORATION (JP) | 1990-05-02 | — | — | EP | disclosed |