Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.48 |
| ▸ | MEN1 | O00255 | 2/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.48 |
| ▸ | NPC1 | O15118 | 1/20 | 0.48 |
| ▸ | RAB9A | P51151 | 1/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.47 |
| ▸ | TSHR | P16473 | 3/20 | 0.45 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.43 |
| ▸ | CA12 | O43570 | 1/20 | 0.41 |
| ▸ | HPGD | P15428 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4053019 | 0.89 | TSHR (0.45) | SMN1; SMN2MEN1KMT2ANPC1RAB9A | |
| SCHEMBL28316374 | 0.87 | ALDH1A1 (0.44) | SMN1; SMN2MEN1KMT2ANPC1RAB9A | |
| SCHEMBL28173524 | 0.86 | CYP1A2 (0.46) | SMN1; SMN2MEN1KMT2AALDH1A1TSHR | |
| SCHEMBL731101 | 0.82 | TSHR (0.56) | SMN1; SMN2MEN1KMT2ANPC1RAB9A | |
| Hydrochloric Acid SCHEMBL11759847 | 0.81 | TSHR (0.55) | SMN1; SMN2MEN1KMT2ANPC1RAB9A | |
| SCHEMBL30956253 | 0.80 | HSD17B10 (0.62) | SMN1; SMN2MEN1KMT2ANPC1RAB9A | |
| SCHEMBL13777208 | 0.80 | HSD17B10 (0.62) | SMN1; SMN2MEN1KMT2ANPC1RAB9A | |
| SCHEMBL283959 | 0.80 | MEN1 (0.47) | SMN1; SMN2MEN1KMT2ANPC1RAB9A | |
| SCHEMBL215722 | 0.80 | MEN1 (0.47) | SMN1; SMN2MEN1KMT2ANPC1RAB9A | |
| SCHEMBL28074082 | 0.78 | ALDH1A1 (0.39) | SMN1; SMN2MEN1KMT2ANPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110361931-B | Antireflective hardmask composition | 厦门恒坤新材料科技股份有限公司 | 2022-08-05 | — | — | CN | claimed |
| CN-102060980-A | Resist underlayer polymer, resist underlayer composition including the same, and method of patterning using the same | CHEIL IND INC | 2011-05-18 | — | — | CN | claimed |
| WO-2024036679-A1 | ANTI-REFLECTIVE COATING COMPOSITION | 嘉庚创新实验室 | 2024-02-22 | — | — | WO | disclosed |
| CN-111095106-B | Pattern forming method, ion implantation method, laminate, kit, and method for manufacturing electronic device | 富士胶片株式会社 | 2023-07-28 | — | — | CN | disclosed |
| WO-2023070957-A1 | ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER | 嘉庚创新实验室 | 2023-05-04 | — | — | WO | disclosed |
| CN-111095106-A | Pattern forming method, ion implantation method, laminate, kit, resist underlayer film forming composition, resist composition, and method for manufacturing electronic device | 富士胶片株式会社 | 2020-05-01 | — | — | CN | disclosed |
| CN-105143390-B | Organic film chemical and mechanical grinding paste material constituent and the grinding method for using it | 三星SDI株式会社 | 2019-08-13 | — | — | CN | disclosed |
| CN-105555829-B | Polymers and compositions comprising the same | DNF有限公司 | 2017-08-01 | — | — | CN | disclosed |
| CN-102060980-B | Resist underlayer polymer, resist underlayer composition including the same, and method of patterning using the same | CHEIL IND INC | 2013-12-11 | — | — | CN | disclosed |
| CN-102060980-A | Resist underlayer polymer, resist underlayer composition including the same, and method of patterning using the same | CHEIL IND INC | 2011-05-18 | — | — | CN | disclosed |
| US-6514663-B1 | Bottom resist | INFINEON TECHNOLOGIES AG (DE) | 2003-02-04 | — | — | US | disclosed |