Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 2/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.47 |
| ▸ | NPC1 | O15118 | 1/20 | 0.47 |
| ▸ | RAB9A | P51151 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.46 |
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.42 |
| ▸ | HPGD | P15428 | 2/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | THRB | P10828 | 1/20 | 0.41 |
| ▸ | CA12 | O43570 | 1/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL215722 | 1.00 | MEN1 (0.47) | MEN1KMT2ASMN1; SMN2NPC1RAB9A | |
| SCHEMBL284468 | 0.86 | ALDH1A1 (0.42) | MEN1KMT2ASMN1; SMN2NPC1RAB9A | |
| SCHEMBL284471 | 0.86 | ALDH1A1 (0.42) | MEN1KMT2ASMN1; SMN2NPC1RAB9A | |
| SCHEMBL8665555 | 0.85 | ALDH1A1 (0.44) | MEN1KMT2ASMN1; SMN2ALDH1A1TSHR | |
| SCHEMBL8665553 | 0.85 | ALDH1A1 (0.44) | MEN1KMT2ASMN1; SMN2ALDH1A1TSHR | |
| SCHEMBL283799 | 0.84 | CYP1A2 (0.48) | MEN1KMT2ASMN1; SMN2ALDH1A1TSHR | |
| SCHEMBL283802 | 0.84 | CYP1A2 (0.48) | MEN1KMT2ASMN1; SMN2ALDH1A1TSHR | |
| SCHEMBL28110935 | 0.80 | SMN1; SMN2 (0.52) | MEN1KMT2ASMN1; SMN2ALDH1A1TSHR | |
| SCHEMBL6926349 | 0.80 | SMN1; SMN2 (0.48) | MEN1KMT2ASMN1; SMN2NPC1RAB9A | |
| SCHEMBL13777208 | 0.79 | HSD17B10 (0.62) | MEN1KMT2ASMN1; SMN2NPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 390 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240294771-A1 | ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER | Tan Kah Kee Innovation Laboratory (CN) | 2024-09-05 | — | — | US | claimed |
| CN-118244576-A | Photosensitive resin composition and cured film thereof | 罗门哈斯电子材料韩国有限公司 | 2024-06-25 | — | — | CN | claimed |
| WO-2023070957-A1 | ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER | 嘉庚创新实验室 | 2023-05-04 | — | — | WO | claimed |
| CN-113913075-B | Anti-reflective coating composition and crosslinkable polymer | 嘉庚创新实验室 | 2022-09-20 | — | — | CN | claimed |
| CN-113913075-A | Anti-reflective coating composition and crosslinkable polymer | 嘉庚创新实验室 | 2022-01-11 | — | — | CN | claimed |
| CN-122072436-A | Negative photosensitive resin composition, cured film, and resist film | DIC株式会社 | 2026-05-22 | — | — | CN | disclosed |
| CN-122072438-A | Underlayer composition for manufacturing electronic devices | 杜邦电子材料国际有限责任公司 | 2026-05-22 | — | — | CN | disclosed |
| US-20260140448-A1 | UNDERLAYER COMPOSITION FOR USE IN MANUFACTURING ELECTRONIC DEVICES | DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) | 2026-05-21 | — | — | US | disclosed |
| US-20260132241-A1 | MAIN CHAIN SCISSIONABLE BLOCK COPOLYMERS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) | 2026-05-14 | — | — | US | disclosed |
| US-20260118762-A1 | POLYMER FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION | Tan Kah Kee Innovation Laboratory (CN) | 2026-04-30 | — | — | US | disclosed |
| US-20260118761-A1 | COMPOUND FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, POLYMER, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION | Tan Kah Kee Innovation Laboratory (CN) | 2026-04-30 | — | — | US | disclosed |
| US-20260093176-A1 | ELECTROACTIVE COMPOUNDS, COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) | 2026-04-02 | — | — | US | disclosed |
| EP-1275666-A1 | NOVEL FLUOROPOLYMER HAVING ACID-REACTIVE GROUP AND CHEMICAL AMPLIFICATION TYPE PHOTORESIST COMPOSITION CONTAINING THE SAME | Daikin Industries, Ltd. (JP) | 2003-01-15 | — | — | EP | disclosed |
| US-6159652-A | Positive resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-12-12 | — | — | US | disclosed |
| US-6090518-A | HAVING HIGH RESOLUTION, WHICH IS USEFUL FOR A HALFMICRONLITHOGRAPHY EMPLOYING A RADIATION | MITSUBISHI CHEMICAL CORPORATION (JP) | 2000-07-18 | — | — | US | disclosed |
| US-5955240-A | MODIFIED POLYHYDROXYSTYRENE, ACID GENERATING CHEMICAL, CARBOXYLIC ACID, AMINE | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-09-21 | — | — | US | disclosed |
| US-5854357-A | Process for the production of polyhydroxstyrene | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-12-29 | — | — | US | disclosed |
| US-5736296-A | Positive resist composition comprising a mixture of two polyhydroxystyrenes having different acid cleavable groups and an acid generating compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-04-07 | — | — | US | disclosed |
| EP-0679951-B1 | Positive resist composition | TOKYO OHKA KOGYO CO LTD (JP) | 1997-01-15 | — | — | EP | disclosed |
| EP-0679951-A1 | Positive resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-11-02 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260132241-A1 | MAIN CHAIN SCISSIONABLE BLOCK COPOLYMERS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | DCLRE1A, CD79B, RAD1 | MEN1 3439/4885KMT2A 2746/4885SMN1; SMN2 3876/4885 |
| US-20260093176-A1 | ELECTROACTIVE COMPOUNDS, COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | ETV6, KCNQ4, KCNQ1 | MEN1 2462/4885KMT2A 1036/4885SMN1; SMN2 2718/4885 |
| US-20260118761-A1 | COMPOUND FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, POLYMER, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION | RAD51, COL2A1, MRPL11 | MEN1 3809/4885KMT2A 4209/4885SMN1; SMN2 1809/4885 |
| US-20260118762-A1 | POLYMER FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION | SEC23B, SEC23IP, SEC16A | MEN1 3039/4885KMT2A 4237/4885SMN1; SMN2 3507/4885 |
| US-20260140448-A1 | UNDERLAYER COMPOSITION FOR USE IN MANUFACTURING ELECTRONIC DEVICES | ARCN1, ASH2L, ITGB4 | MEN1 3327/4885KMT2A 1033/4885SMN1; SMN2 3469/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.